AFO Synthesis Domain Ontology (WD/2026/03)
P has output c if and only if c is a participant in p, c is present at the end of p, and c is not present at the beginning of p. [RO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV light generated by the interference of multiple coherent lasers. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
multiple-laser-beam interference lithography
Al metallisation
The deposition of a layer of aluminium on a substrate (usually to provide electrical contacts in devices). A number of techniques may be used for metallization including evaporation and sputter coating. [CHMO]
aluminium metallisation
Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics). [CHMO]
A method for producing metal nanoparticles by the reduction of metal salts with tetraalkylammonium hydrotriorganoborates. The resulting colloids are highly active hydrogenation catalysts. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. Shuttered pulses (30-100 ms) of mask-defined UV (365 nm) light are flashed into a continuous stream of resist inside a microchannel, leading to the formation of solid structures almost instantaneously. [CHMO]
conventional emulsion polymerisation
A polymer preparation technique in which monomer (usually acrylic) droplets are dispersed in a continuous aqueous phase and are kept colloidally stable through the use of a surfactant. [CHMO]
emulsion polymerisation
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then immersed in a liquid with RI >1 (e.g. highly purified water) and exposed to a pattern of intense UV light. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
surface initiated polymerisation
An experimental method used to prepare polymer samples (e.g. polymer brushes) using a surface-imobilised monomer. [CHMO]
surface-initiated polymerisation
A process for shaping pliable thermoplastic polymers. An elastomeric mould is placed on a polymer that has been spin-coated onto a substrate. The system is then heated above the glass transition temperature of the polymer. Capillary force allows the polymer melt to fill up the void space between the polymer and the mould. After cooling to ambient temperature, the mould is removed, generating the negative replica of the mould pattern. [CHMO]
A synthesis method where a flow of carrier gas (moving faster than the speed of sound) containing vaporised precursors is projected onto a surface, resulting in a deposit. [CHMO]
high hower pulsed magnetron sputter deposition
high impact power magnetron sputter deposition
high power impulse magnetron sputter deposition
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The ionization process uses extremely high power densities of the order of kW cm-2 in short pulses. [CHMO]
A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then pressed into the resist, whilst both the substrate and mould are heated to the glass transition temperature of the polymer. The resist is then cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. [CHMO]
A synthesis technique which uses X-rays to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of X-rays is scanned across a patterned mask. The mask consists of an X-ray absorber (e.g. Au) on a membrane that is transparent to X-rays (e.g. SiC). The X-rays induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]
Any synthesis technique involving the transfer of a pattern to a material (a 'resist') by selective exposure to a radiation source (e.g. light or X-rays) or to a beam of charged particles. Upon irradiation, the material experiences a change in its physical properties. Excess material is then removed, by a liquid 'developer' or an etching process. [CHMO]
A synthesis technique where a high-power pulsed laser beam is focused (inside a vacuum chamber) onto a target of the desired composition. Material is then vaporized from the target ('ablation') and deposited as a thin film on a substrate facing the target. [CHMO]
A synthesis technique where a Pt metal target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin film of Pt, on a substrate. [CHMO]
A synthesis method where a rapidly heated substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
rapid thermal chemical vapour deposition
Any synthesis method used to grow crystals. [CHMO]
Any method used to prepare a polymer. [CHMO]
A method for crystal growth where polycrystalline SiC lumps are carefully packed between two concentric graphite tubes. The inner tube is then withdrawn leaving a porous SiC layer inside the outer tube. The outer tube is then heated (~2500 deg. C) in Ar, causing the SiC powder to sublime and nucleate on a cooler surface. [CHMO]
The synthesis of metal-containing compounds in poly(ethylene glycol) which is irradiated with ultrasonic (>20 kHz) waves. The ethylene glycols act as both the solvent and reducing agent. [CHMO]
A process used to create polymer fibers. Molten polymer is forced through a spinneret (a multi-pored device similar to a shower head) and cooled to form multiple continuous filaments. [CHMO]
A synthesis method that involves both the chemical decomposition of a precursor gas and the vaporization of a solid source e.g. the growth of MgB2 involves both diborane gas and solid Mg. [CHMO]
hybrid physical-chemical vapour deposition
hybrid physical-chemical vapor deposition
two-step UV-assisted capillary force lithography
two-step UV-assisted capillary force lithography (CFL)
A process for shaping pliable thermoplastic polymers. An elastomeric (polyurethane acrylate) mould is placed on a UV-curable polymer that has been spin- or drop-coated onto a substrate and partially cured using UV light (200-400 nm). Capillary force allows the polymer melt to fill up the void space between the polymer and the mould, generating a negative replica of the mould pattern. The process is repeated with a second mould and exposure to UV light. Two-step UV-assisted capillary force lithography is used to generate micro/nanoscale combined hierarchical structures. [CHMO]
A development method where the substrate is first immersed in a colloidal gold solution (containing negatively charged gold particles) at low pH. Gold subsequently deposits on any organic molecules containing postively charged groups at this pH. In the second step, the surface is treated with another solution containing gold chloride and hydroxylamine which causes the reduction of gold ion, producing a further gold deposit on the exisiting gold layer. Single-metal deposition is used to enhance latent fingermarks. [CHMO]
A synthesis technique involving the transfer of a nanosized pattern to a material using a micelle solution of a block copolymer. A glass or silicon substrate is dipped into the solution, retrieved, and the solvent is allowed to evaporate in air. A plasma treatment (O2, H2 or Ar) is performed to remove the polymer shell leaving a pattern. [CHMO]
A method for synthesising gold nanoparticles from HAuCl4 in non-aqueous solution (e.g. toluene) using tetraoctylammonium bromide as a phase-transfer catalyst and sodium borohydride to reduce Au(III) to Au(0). [CHMO]
A synthesis method where a pattern or ink layer is dpolymern on a substrate using a liquid dispensed through a microsized conical nozzle. The movement of the 'micropen' is controlled by a computer program. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from a molecular beam of organometallic precursors) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]
A process for shaping pliable polymer materials using a nanosized rigid frame or model called a 'mould'. The mould is filled with a prepolymer then the whole assembly is transferred to a flat substrate where the prepolymer is cross-linked and the mould removed. [CHMO]
A chemical process in which a prepolymer is converted into a polymer and then into a network, upon application of heat. [CHMO]
A process for shaping pliable thermoplastic or thermosetting plastics using a rigid frame or model called a 'mould'. The plastic is fed into a heated barrel, mixed, and forced into a mould where it cools and hardens to the configuration of the mould. [CHMO]
injection moulding
A method for dispersing two or more immiscible liquid by shaking, stirring or homogenising the mixture. The emulsion is stablised by adding finely divided insoluble solid particles (e.g. latex or silica). [CHMO]
A process used to created very fine (µm or nm scale) fibres from a liquid. A high voltage is applied to a droplet of the liquid sample which is drawn out into fibres and cooled in air. [CHMO]
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then react with a gas that is introduced into the chamber and the products deposit, as a thin-film, on a substrate. [CHMO]
A synthesis technique that uses ions to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a focused ion beam (75 keV He ions) is scanned across a patterned mask inducing chemical reactions in the resist. The desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]
A synthesis technique that uses mechanical deformation and cross-linking to transfer a pattern to a substrate. A solution of photosensitive resist (a polymer) is deposited on the substrate by spin coating. A transparent stamp (e.g. fused silica) containing the desired (nanosized) pattern on its surface is then pressed into the resist, which is exposed to UV light. Any unexposed areas of polymer are removed by reactive ion etching. [CHMO]
A synthesis method where an electrical discharge is passed under reduced pressure between two electrodes. [CHMO]
Any method for the synthesis of polymer membranes that involves the polymer transforming from the liquid phase of the cast solution to the solid phase. [CHMO]
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a gas. [CHMO]
micro-emulsion polymerisation
A polymer preparation technique in which monomer (usually acrylic) <100 nm droplets are dispersed in a continuous aqueous phase and are kept colloidally stable through the use of a surfactant and a cosurfactant e.g. hexanol. [CHMO]
microemulsion polymerisation
pressure-pulsed chemical vapour infiltration
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a vapour which is applied as a series of high pressure pulses. This results in a multilayer structure. [CHMO]
pressure-pulsed chemical vapor infiltration
A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose (catalysed by a hot filament) on the surface to produce a deposit. [CHMO]
The synthesis of metal-containing compounds in poly(ethylene glycol)s. The ethylene glycol acts as both the solvent and reducing agent. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. A mask ('photomask') with the desired pattern is then placed in contact with the substrate and both are exposed to intense UV light. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
A synthesis method where a flow of precursors is projected onto a surface, resulting in a deposit. [CHMO]
A process for shaping pliable polymer material using multiple microsized rigid frames or models called 'moulds'. The polymer material (in liquid form) is injected into a mould using a small diameter piston and then allowed to harden or set inside the mould, adopting its shape. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV light and a post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
Any synthesis technique involving the transfer of a nanosized pattern to a material. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. Shuttered pulses (30-100 ms) of mask-defined UV (365 nm) light are flashed into a stationery layer of monomer inside microchannel. Objects generated by this process are 'locked' by relief structures in the channel, before being flushed out. The process is then repeated in a cyclic manner. [CHMO]
A development technique where the substrate is placed in a vacuum (10^{-4} Pa) and two metal electrodes are melted and evaporated (sequentionally) by passing a current through them. When the metal atoms hit the (much cooler) substrate they condense into nanoscale particles, forming a thin deposit on the surface. When vacuum metal deposition is used to enhance latent fingermarks on polymer surfaces, a Au layer is applied first, followed by a much thicker Zn layer (which does not deposit on the fingermark ridges). [CHMO]
atomic-layer chemical vapour deposition
A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a monolayer deposit. The surface reaction is self-limiting resulting in a nanometre thickness of film. [CHMO]
atomic layer chemical vapour deposition
Any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. [CHMO]
A synthesis technique where a solid target is bombarded with electrons causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [CHMO]
A type of lithography where electrons or ions are used to generate pattern, which is transferred to a resist. [CHMO]
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. Ionization of the neutral gas atoms requires a plasma (a partially ionized gas containing free electrons) source to be generated by passing an electrical discharge through the chamber, with the target acting as the cathode. [CHMO]
A method for the synthesis of carbon nanotubes where a laser beam (typically a YAG laser) is focused onto a graphite-metal target located in a quartz tube surrounded by a furnace. The target is vaporised in high temperature Ar gas producing single-walled and double-walled carbon nanotubes which are collected at a trap. [CHMO]
laser vaporisation method
A synthesis method in which the components of the sample spontaneously (and reversibly) associate by non-covalent interactions, taking the form of an existing lithographically templated structure or pattern. [CHMO]
A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then held above the resist, whilst both the substrate and mould are heated to the glass transition temperature of the polymer. The resist is then cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. During the heat-cool cycle the initially flat polymer film self-assembles into periodic supramolecular pillar arrays. [CHMO]
A technique that utlilises the movement of particles under the influence of an electric field (e.g. electroosmosis or electrophoresis) in conjunction with illumination of a photosensitive substrate to form a pattern. Particles suspended in DI water are placed between two parallel ITO electrodes biased with an AC signal. Light of wavelength 1064 nm is used to heat the fluid sample and induce an electrohydrodynamic microvortex, bringing the particles towards its centre, forming a pattern. [CHMO]
hydride vapour phase epitaxy
A synthesis method which consists of depositing a monocrystalline film, from vapour-phase precursors (in hydrogen or ammonia carrier gases), on a monocrystalline substrate. [CHMO]
hydride vapour-phase epitaxy
A method applied to polymer films to increase polymer chain mobility. The film is exposed to a solvent atmosphere at room-temperature causing it to swell. [CHMO]
solvent vapour annealing
The reaction of hydrocarbons with steam at high temperature (700-1000 deg. C) in order to produce hydrogen. [CHMO]
A development method where the substrate is first immersed in a colloidal gold solution (containing negatively charged gold particles) at low pH. Gold subsequently deposits on any organic molecules containing postively charged groups at this pH. In the second step, the surface is treated with a solution containing silver acetate and hydroquinone which causes the reduction of silver ions, producing a silver deposit on the exisiting gold layer. Multi-metal deposition is used to enhance latent fingermarks. [CHMO]
A synthesis technique where a solid target is bombarded with electrons or energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [CHMO]
rotomoulding
A process for shaping pliable thermoplastic or thermosetting plastics using a rigid frame or model called a 'mould'. The plastic is placed in a heated mould, which is slowly rotated causing the melted plastic to flow into to the mould and stick to its walls. [CHMO]
rotational moulding
A process used to create polymer fibers. Polymer dissolved in a solvent is forced through a spinneret (a multi-pored device similar to a shower head) and the solvent is removed from the polymer fibres by evaporation. [CHMO]
A synthesis method in which a film of solid metal is deposited from a solution of ions onto an electrically conducting surface (an electrode). Three electrodes are required (working, counter and reference) and when sufficient current is passed through the solution, accompanied by irradiation with UV light, metal ions are reduced at the working electrode. [CHMO]
hydrogen direct current arc-discharge method
hydrogen direct-current arc-discharge method
A method for the synthesis of carbon nanotubes where a direct-current arc voltage is applied across two graphite electrodes immersed in H2 gas. When pure graphite rods are used, fullerenes are deposited as soot inside the chamber, and multi-walled carbon nanotubes are deposited on the cathode. When a graphite anode containing a metal catalyst (Fe or Co) is used with a pure graphite cathode single-walled carbon nanotubes are generated in the form of soot. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV (240 nm) light and a post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
A method of growing a single crystal 'ingot' or 'boule'. The polycrystalline sample is heated in a container above its melting point and slowly cooled from one end where a seed crystal is located. Single crystal material is then progressively formed along the length of the container. [CHMO]
The process of filling in the pores of a material (e.g. a ceramic) by reaction with polymer precursors. [CHMO]
A synthesis technique that uses mechanical deformation and cross-linking to transfer a pattern to a substrate. A solution of photosensitive organosilicon resist (a polymer) is deposited on the substrate by spin coating. A transparent stamp (e.g. quartz) containing the desired (nanosized) pattern on its surface is then pressed into the resist, which is exposed to UV light. Any unexposed areas of polymer are removed by reactive ion etching. [CHMO]
Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics) by exposing the hydrocarbons to high pressures and temperatures. [CHMO]
A chemical process in which a prepolymer is converted into a polymer and then into a network, upon irradiation with light. [CHMO]
A synthesis method where a plasma (a partially ionized gas containing free electrons) containing precursors is projected onto a surface, resulting in a deposit. [CHMO]
A technique for growing crystals of SiC by heating a source (polycrystalline SiC or powder) at high temperature (1800-2600 deg. C) and low pressure in an Ar atmosphere causing it to sublime. The vapours then condense on a single crystal of SiC (the 'seed'). [CHMO]
A process for forming thermoplastic polymer samples by dipping a mould into a solution of the polymer and drawing off the solvent to leave a polymer film adhering to the mould. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from a molecular beam of reactive gases) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]
The reaction of ethanol with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]
A synthesis method for transferring a pattern to a gold surface. A PDMS stamp is coated in an alkanethiol and then brought into contact with a gold surface. Thiol from the wet region generates patterned features of SAMs on the gold surface. [CHMO]
near-field conformational photolithography
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. A transparent PDMS mask with the desired pattern (in relief) on its surface is placed in contact with the photoresist layer. UV light (300-460 nm) is then used to cross-link the polymer. Light passing through the stamp is modulated in the near-field by the relief of the mask such that the edges of the relief structures correspond to nulls in the intensity of the light. The polymer is cross-linked in the remaining areas. [CHMO]
temperature gradient chemical vapour infiltration
temperature gradient chemical vapor infiltration
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from a vapour, accelerated by a temperature gradient. [CHMO]
temperature-gradient chemical vapour infiltration
temperature-gradient chemical vapor infiltration
micro-transfer moulding
A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. The mould is filled with a prepolymer then the whole assembly is transferred to a flat substrate where the prepolymer is cross-linked and the mould removed. [CHMO]
microtransfer moulding
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'), which deposit, as a thin-film, on a substrate. A secondary ion beam is then used to remove any partially bound atoms from the substrate surface. [CHMO]
A synthesis technique where the material to be deposited is heated until evaporation in a vacuum (<10^{-4} Pa) and eventually deposits as a thin film by condensing on a (cold) substrate. [CHMO]
Any method for the synthesis or processing of colloids (mixtures where one substance is dispersed evenly throughout another). [CHMO]
Any synthesis technique involving the transfer of a microsized pattern to a material (a 'resist') by selective exposure to a radiation source (e.g. light or X-rays) or to a beam of charged particles. Upon irradiation, the material experiences a change in its physical properties which changes its response to a developer solution (making it either soluble or insoluble). The desired pattern is then obtained by removing any excess resist with the developer. [CHMO]
Any synthesis technique which uses elastomeric stamps, moulds, and conformable photomasks prepared from liquid polymer precursors. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from a molecular beam) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]
plasma assisted chemical vapour deposition
plasma-enhanced chemical vapour deposition
plasma assisted chemical vapor deposition
plasma-enhanced chemical vapor deposition
A synthesis method where the substrate is exposed to one or more volatile precursors, in the presence of a plasma (a partially ionized gas, containing free electrons), which react or decompose on the surface to produce a deposit. The plasma enhances the rate of reaction on the substrate surface. [CHMO]
plasma-assisted chemical vapour deposition
plasma-assisted chemical vapor deposition
The reaction of hydrocarbons with oxygen and carbon dioxide at 950-1100 deg. C to form syngas. [CHMO]
A synthesis method where a substrate is placed in a heated atmosphere (600-800 deg. C) and exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
thermal chemical vapour deposition
A process for shaping pliable polymer material using a rigid frame or model called a 'mould'. The pre-heated material is first placed in an open, heated mould which is then closed before pressure is applied to it. The applied pressure forces the softened polymer to adopt the shape of the mould. [CHMO]
compression moulding
A synthesis technique where a metal-containing precursor, dissolved in a solvent, is atomised and ignited. During combustion the flame is directed at the substrate resulting in the deposition of a thin layer of metal. [CHMO]
A synthesis method for growing single crystals from an aqueous solution in an autoclave (a thick-walled steel vessel) at high temperature (400 deg. C) and pressure. [CHMO]
pulsed-laser polymerisation
A polymerization which is initiated by laser pulses at a constant repetition rate. [CHMO]
pulsed laser polymerisation
A synthesis technique that uses ions to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a focused ion beam (75 keV He ions) is scanned across it in a patterned fashion. The ions induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]
A chemical process in which a prepolymer or polymer is converted into a polymer of higher molar mass and then into a network. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV light generated by the interference of two or more coherent light sources. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
A synthesis method where the substrate is exposed to one or more volatile precursors, in the presence of a microwave-induced plasma (a partially ionized gas containing free electrons), which react or decompose on the surface to produce a deposit. The plasma enhances the rate of reaction on the substrate surface. [CHMO]
microwave plasma-assisted chemical vapour deposition
microwave plasma-assisted chemical vapor deposition
A method for the synthesis of carbon nanotubes where a direct-current arc voltage is applied across two graphite electrodes immersed in an inert gas such as He. When pure graphite rods are used, fullerenes are deposited as soot inside the chamber, and multi-walled carbon nanotubes are deposited on the cathode. When a graphite anode containing a metal catalyst (Fe or Co) is used with a pure graphite cathode single-walled carbon nanotubes are generated in the form of soot. [CHMO]
The reaction of natural gas or syngas with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. The nickel catalyst is then oxidised with air and finally reduced back to the metal using more hydrocarbon gas. [CHMO]
A synthesis method in which thin films of oppositely charged layers are deposited in sequence. Positive or negative charged species are adsorbed onto the sample surface by dipping the substrate into solutions. The excess solution, after each adsorption step, is rinsed with solvent. [CHMO]
A polymerization process where the hydrophilic monomer is solubilised inside surfactant reverse micelle structures. [CHMO]
reverse micelle polymerisation
A process in which a metal oxide is reduced in the presence of carbon or a carbon-containing compound. [CHMO]
A process where molecules spontaneously adopt a defined arrangement. [CHMO]
A technique for preparing a polymer membrane by mixing polymer and solvent, then casting this solution onto a surface and allowing the solvent to partially evaporate. The film is them immersed in a nonsolvent causing solidification. [CHMO]
Any experimental method used to prepare polymer samples where the monomer is suspended as liquid droplets in a continuous water phase by means of strong agitation and the presence of a suspending agent. [CHMO]
suspension polymerisation
Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics) in the presence of a metal catalyst and under a high pressure of H2 gas. An electric current is used to heat the catalyst. [CHMO]
The process of the settling of particles (atoms or molecules) from a solution or suspension onto a pre-existing surface, resulting in the growth of a new phase. [CHMO]
A chemical process in which a prepolymer is converted into a polymer and then into a network, upon irradiation with light in the range 190-400 nm. [CHMO]
A method for dispersing two or more immiscible liquids as µm-sized droplets by shaking, stirring or homogenising the mixture. [CHMO]
The process of two individual components of a sample associating to form a new pattern or structure. [CHMO]
A process used to create polymer fibers. Polymer in a gel state is forced through a spinneret (a multi-pored device similar to a shower head). The fibres are then air dried and cooled in a liquid bath. [CHMO]
The conversion of an organic material in an inert atmosphere at temperatures in excess of 1800 °C to produce a graphite crystal structure. [CHMO]
graphitisation
supercritical fluid molecular spray film deposition
A synthesis method where a solid material is dissolved in a supercritical fluid (at elevated pressure) which is forced through a small orifice into a region of relatively low pressure. This produces a molecular spray which is directed against a substrate where it deposits as a thin film. [CHMO]
Any synthesis process where colloidal particles suspended in a liquid medium migrate under the influence of an electric field and are deposited on an electrode. [CHMO]
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The substrate is held in a barrel which is swung from side-to-side to ensure even deposition. [CHMO]
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from a vapour held at high pressure. [CHMO]
forced-flow chemical vapour infiltration
A synthesis method for metal nanopowders that consists of passing a pulse of a high-density current (104-n106 A/mm2) through a wire causing the explosive disintegration of the metal (accompanied by a bright flash of light, a shock wave, the dispersion of the metal, and the fast expansion of a mixture of boiling metal droplets and vapour to the surrounding medium) and the production of metal , particles with characteristic sizes of tens of µm to a few nm. [CHMO]
supramolecular assistance to covalent synthesis
A synthesis method which relies on the use of reversible noncovalent bonding interactions between molecular building blocks in order to preorganise them into a certain relative geometry as a prelude to covalent bond formation. [CHMO]
laser assisted direct imprint lithography
A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of photosensitive resist (a polymer) is deposited on a silicon substrate by spin coating. A transparent stamp (e.g. quartz) containing the desired (nanosized) pattern on its surface is then pressed into the resist and a single laser pulse (XeCl excimer laser) is applied to melt the top layer of silicon. The molten silicon flows into the pattern then rapidly solidifies. [CHMO]
laser-assisted direct imprint lithography
A process used to create polymer fibers using a spinneret (a multi-pored device similar to a shower head) to form multiple continuous filaments. [CHMO]
Any synthesis technique where a scanning probe microscope is used to pattern surfaces either constructively (by depositing a substance) or destructively (by etching a pattern in a surface). [CHMO]
Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics) in the presence of a catalyst and under a high pressure of H2 gas. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from a beam of evapourated metal particles) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]
A synthesis technique where a monomer is irradiated with UV light, causing cross-linking and the deposition of a polymer film on a substrate. [CHMO]
The process of the settling of (nm sized) particles from a colloidal suspension onto a pre-existing surface, resulting in a ceramic thin film. The desired solid particles (e.g. metal alkoxides) are suspended in a liquid, forming the 'sol', which is deposited on a membrane template or mould by spinning, dipping or coating, The particles in the sol are polymerised by partial evaporation of the solvent, or addition of an initiator, forming the 'gel', which is then heated at high temperature to give the final solid product. [CHMO]
Any synthesis technique which uses elastomeric stamps, molds, and conformable photomasks prepared from multiple liquid polymer precursors. [CHMO]
A synthesis method where an electron beam is used to decompose gaseous molecules leading to deposition of a solid on a nearby substrate. [CHMO]
jet vapour deposition
jet-vapour deposition
vapour jet deposition
vapour-jet deposition
A synthesis method where a flow of carrier gas (moving at the speed of sound) containing vaporised precursors is projected onto a surface, resulting in a deposit. [CHMO]
metal organic vapour phase epitaxy
metalorganic vapour phase epitaxy
organometallic vapour phase epitaxy
A synthesis method which consists of depositing a monocrystalline film, from organometallic vapour-phase precursors, on a monocrystalline substrate. [CHMO]
metal-organic vapour-phase epitaxy
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense EUV (13.5 nm) light in a vacuum. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from liquid or gaseous precursors) on a monocrystalline substrate. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. Shuttered pulses (30-100 ms) of mask-defined UV (365 nm) light are flashed into a stationery layer of monomer, which is sandwiched inside a microchannel before being flushed out. The process is then repeated in a cyclic manner. [CHMO]
The reaction of natural gas with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]
Any process for shaping pliable polymer materials using a rigid frame or model called a 'mould'. The polymer material (in liquid form) hardens or sets inside the mould, adopting its shape. [CHMO]
moulding
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a liquid or vapor. [CHMO]
A method for the synthesis of solid particles from an aerosol. The desired solid particles are suspended in a liquid, which is heated to 275-330 deg. C under pressure and passed through an orifice so that an aerosol forms. The particles in the aerosol are polymerised by partial evaporation of the solvent. [CHMO]
A process for shaping pliable thermoplastic or thermosetting plastics using a rigid frame or model called a 'mould'. The plastic is heated and shaped into a tube then a pressurized gas, usually air, is used to expand the plastic and press it against the mould. [CHMO]
blow moulding
A process for shaping pliable thermoplastic polymers. An elastomeric (polyurethane acrylate) mould is placed on a UV-curable polymer that has been spin- or drop-coated onto a substrate and partially cured using UV light (200-400 nm). The system is then further exposed to UV light and capillary force allows the polymer melt to fill up the void space between the polymer and the mould. After cooling to ambient temperature, the mould is removed, generating the negative replica of the mould pattern. [CHMO]
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The sign of the anode-cathode bias is varied at a high rate to avoid charge build-up on insulating targets. [CHMO]
A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (10-20 keV) is scanned across it in a patterned fashion. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The electron beam can be focused using either electric or magnetic fields. [CHMO]
A method of producing large single crystals (of semiconductors or metals) by inserting a small seed crystal into a crucible filled with similar molten material, then slowly pulling the seed up from the melt while rotating it. [CHMO]
atmospheric pressure chemical vapour deposition
atmospheric pressure chemical vapor deposition
A synthesis method where the substrate is exposed to one or more volatile precursors, at atmospheric pressure, which react or decompose on the surface to produce a deposit. [CHMO]
atmospheric-pressure chemical vapour deposition
atmospheric-pressure chemical vapor deposition
The process of the settling of (nm sized) particles from a colloidal suspension onto a pre-existing surface, resulting in ceramic materials. The desired solid particles (e.g. metal alkoxides) are suspended in a liquid, forming the 'sol', which is deposited on a substrate by spinning, dipping or coating, or transferred to a mould. The particles in the sol are polymerised by partial evaporation of the solvent, or addition of an initiator, forming the 'gel', which is then heated at high temperature to give the final solid product. [CHMO]
A synthesis method in which colloidal particle suspensions in thin evaporating films spontaneously (and reversibly) associate by non-covalent interactions. [CHMO]
A process where the components of a sample spontaneously (and reversibly) associate by non-covalent interactions, forming an organised structure or pattern. Individual building blocks associate into more complex (higher-order) structures during self-assembly. [CHMO]
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. Ionization of the neutral gas atoms requires an external ion source, which generates a focused ion beam. [CHMO]
A process for shaping pliable polymer material using a microsized rigid frame or model called a 'mould'. A PDMS mould is etched with a fluoride-containing substance (breaking Si-O bonds at the surface). The fresh PDMS surface then reacts with a prepolymer. [CHMO]
aerosol-assisted chemical vapour deposition
aerosol-assisted chemical vapor deposition
A synthesis method where the substrate is exposed to one or more involatile precursors, suspended in a liquid-gas aerosol (generated ultrasonically), which react or decompose on the surface to produce a deposit. [CHMO]
aerosol assisted chemical vapour deposition
aerosol assisted chemical vapor deposition
A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (100 keV) is scanned across an ultrathin (<150 nm thickness) low-atomic-number patterned mask. Many of the electrons are scattered by the mask, so the image is formed only by those electrons that pass through the membrane without scattering. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]
scattering with angular limitation projection electron-beam lithography
The deposition of a layer of metal on DNA by chemically reducing DNA-complexed metal salts (e.g., Ag, Pd, Pt, and Cu). [CHMO]
DNA metallisation
A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. The mould is wetted with a thin layer of solvent. When the polymer is brought into contact with the mould, the top layer of polymer dissolves and expands, filling the mould. The solvent is then allowed to evaporate. [CHMO]
solvent-assisted micromoulding
A patterning technique that involves the self-assembly of nanospheres into a two-dimensional mask (by e.g. spin coating or drop coating). Following self-assembly, a metal is then deposited (e.g. by thermal evaporation, electron beam deposition or pulsed laser deposition) and the nanosphere mask is removed by sonicating the entire sample in a solvent, leaving behind the pattern. [CHMO]
A process for shaping pliable polymer material using a microsized rigid frame or model called a 'mould'. The polymer material (in liquid form) is injected into a mould using a small diameter piston and then allowed to harden or set inside the mould, adopting its shape. [CHMO]
micromoulding
2024-09-12 Changed [OSTHUS] attribution to [Allotrope].
Cell culture is a synthesis method for cells. It involves the dispersal of cells in an artificial environment composed of nutrient solutions. [Allotrope]
remote plasma assisted chemical vapour deposition
remote plasma enhanced chemical vapour deposition
remote plasma assisted chemical vapor deposition
remote plasma enhanced chemical vapor deposition
A synthesis method where the substrate is exposed to one or more volatile precursors which react or decompose in a plasma (a partially ionized gas, containing free electrons) and are then transferred to the surface to produce a deposit. The plasma enhances the rate of reaction. [CHMO]
remote plasma-enhanced chemical vapour deposition
remote plasma-enhanced chemical vapor deposition
A synthesis method where an electrical discharge is passed under reduced pressure between two cathodes. One cathode is the source (or target) composed of the elements required to prepare the sample via sputtering, and the other cathode is the substrate material. When two different (negative) voltages are applied to the two cathodes, glow discharge occurs, causing a build up of the sample on the substrate cathode. [CHMO]
Any synthesis technique involving the transfer of a pattern to a sample. [CHMO]
A method for preparing synthetic gemstones. A finely powdered sample is melted in an hydrogen-oxygen flame (2000 deg. C) and crystallising the melted droplets on a boule (a single crystal). [CHMO]
The process of the settling of particles (atoms or molecules) from a solution, suspension or vapour onto a pre-existing surface, resulting in the growth of a new phase. [CHMO]
A synthesis method where an ion beam (e.g. Ga+) is used to decompose gaseous molecules leading to deposition on a nearby substrate. [CHMO]
A synthesis technique where vaporized molecules or atoms condense on a surface, forming a thin layer. The process is purely physical; no chemical reaction occurs at the surface. [CHMO]
physical vapour deposition
A method for dispersing two or more immiscible liquids by shaking, stirring or homogenising the mixture. [CHMO]
A synthesis method for carbon nanotubes where a hydrocarbon vapor (such as methane) is thermally decomposed in a tube furnace in the presence of a metal catalyst. Carbon nanotubes grow over the catalyst and are collected upon cooling. Low temperatures yield multi-walled carbon nanotubes, whereas high temperatures favour single-walled carbon nanotubes. [CHMO]
chemical vapor deposition synthesis of carbon nanotubes
A synthesis method in which a film of solid metal is deposited from a solution of ions onto an electrically conducting surface (an electrode). Three electrodes are required (working, counter and reference) and when sufficient current is passed through the solution, metal ions are reduced at the working electrode. [CHMO]
A method of depositing crystalline films one molecular layer at a time, by dipping the substrate into water containing a polymer that forms a single layer of molecular chains on the surface. This layer is then transferred from the water to the substrate. [CHMO]
The process of the settling of metal ions from a solution or suspension onto a pre-existing surface. [CHMO]
Any experimental method used to prepare polymer samples. [CHMO]
A synthesis method for growing single crystals from a non-aqueous solution in an autoclave (a thick-walled steel vessel) at high temperature (400 deg. C) and pressure. [CHMO]
A synthesis technique where an atomic force microscope is used to pattern surfaces with molecules or particles. An AFM tip is coated with a chemical compound or biomolecule and put in contact with a substrate, where transfer takes place. [CHMO]
The reaction of hydrocarbons with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]
A process used to create polymer fibers. Polymer dissolved in a solvent is forced through a spinneret (a multi-pored device similar to a shower head) into a chemical bath which causes the polymer to precipitate as it emerges. [CHMO]
A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then pressed into the resist and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. [CHMO]
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a liquid. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from liquid or gaseous precursors) of one substance, on a monocrystalline substrate of a different substance. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from liquid or melt precursors) on a monocrystalline substrate. [CHMO]
vapor phase deposition
vapour phase growth
vapour-phase decomposition
vapour-phase deposition
A synthesis method for carbon nanotubes where an organometallic precursor (typically tungsten-based) is vaporised then heated in an Ar and C2H2 atmosphere to 950 deg. C. [CHMO]
vapour-phase growth
The deposition of a layer of metal on a substrate (usually to provide electrical contacts in devices). A number of techniques may be used for metallization including evaporation and sputter coating. [CHMO]
metallisation
Any patterning technique that utlilises the movement of particles under the influence of an electric field (e.g. electroosmosis or electrophoresis). [CHMO]
A method for preparing a polymer membrane by mixing the polymer with a substance that acts as a solvent a high temperature and casting the solution into a film. When the solution is cooled, solidification occurs. [CHMO]
A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A stamp containing the desired (nanosized) pattern on its surface is placed on the substrate. A roller, heated to the glass transition temperature of the resist, is then used to press the stamp into the resist. The resist is cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. [CHMO]
mini-emulsion polymerisation
A polymer preparation technique in which monomer (usually acrylic) 50-500 nm droplets are dispersed in a continuous aqueous phase and are kept colloidally stable through the use of a surfactant and are stablised against Ostwald ripening using a costabiliser such as hexadecane. [CHMO]
miniemulsion polymerisation
A polymer preparation technique in which an insoluble polymer is dispersed in a continuous organic phase. [CHMO]
dispersion polymerisation
A synthesis method in which the components of the sample spontaneously (and reversibly) associate by non-covalent interactions, forming a organised structure or pattern on a physical template. Individual building blocks associate into more complex (higher-order) structures during self-assembly. [CHMO]
A method for obtaining colloidal solutions of nanoparticles by the condensation of a plasma plume formed by the laser ablation of a bulk metal plate dipped in a solution. [CHMO]
A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer. [CHMO]
vapour phase epitaxy
vapour-phase epitaxial growth
A synthesis method which consists of depositing a monocrystalline film (from vapour-phase precursors) on a monocrystalline substrate. [CHMO]
vapour-phase epitaxy
The synthesis of metal-containing compounds in poly(ethylene glycol)s heated by microwave irradiation. The ethylene glycols act as both the solvent and reducing agent. [CHMO]
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [CHMO]
A synthesis method for growing single crystals from an ionic liquid in an autoclave (a thick-walled steel vessel) at high temperature (400 deg. C) and pressure. [CHMO]
A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. A mould is cast from the object to be replicated. This mould is then filled with a prepolymer, which is cross-linked and the resulting polymer is peeled off the mould. Using a mould, rather than the object itself, allows multiple copies to be made without damaging the original. [CHMO]
replica moulding
A synthesis method in which a film of solid metal is deposited from a solution of ions onto an electrically conducting surface. No external power source is required, but a reductant is added to the solution to initiate the reduction of the metal ions. [CHMO]
distillation precipitation copolymerisation
distillation precipitation copolymerization
A polymer preparation technique in which two different types of monomer are dissolved in an organic solvent and distilled until a precipitate of the corresponding copolymer is formed. [CHMO]
distillation-precipitation copolymerisation
distillation-precipitation copolymerization
A synthesis method in which polymer spheres are assembled into a colloidal crystal on a substrate by evaporation induced self-assembly. The free spaces between the spheres are subsequently infiltrated with a metal by electrodeposition, and the colloidal particles are selectively removed by dissolution in a solvent (e.g. toluene) leaving behind a periodic arrangement of spherical voids embedded in a solid macroporous matrix. [CHMO]
A synthesis method for carbon nanotubes that involves mixing high pressure (e.g. 30 atmospheres) CO that has been preheated (1000 deg. C) and a catalyst precursor gas (metal carbonyl or metallocene). Under these conditions the precursor decomposes forming metal particle clusters on which carbon nanotubes nucleate and grow. The carbon nanotubes are 99% single-walled carbon nanotubes with small diameters (e.g., (5,5) tubes). [CHMO]
The reaction of methanol with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]
A synthesis method for semiconducting single-walled carbon nanotubes where as-grown single-walled carbon nanotubes are treated with a methane plasma at 400-600 deg. C in a vacuum and the metallic single-walled carbon nanotubes are selectively etched. [CHMO]
A synthesis method which uses light and a self-assembled monolayer (SAM) to transfer a pattern to a substrate. A solution of an alkanethiol is deposited on the substrate, forming a SAM. UV light (244 nm) from a scanning near-field optical microscope (aperture size = 50 nm) is then used to oxidise the SAM in certain areas. Either the oxidised areas of the SAM, or the gold corresponding to those areas, is then removed by etching. [CHMO]
A synthesis method where an aerosol containing precursors is projected onto a surface, resulting in a deposit. [CHMO]
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, liquid silicon. [CHMO]
A crystal growth method for metal dichalcogenides in which the starting materials (high purity metal and chalcogen) are placed in a quartz ampoule together with a transport agent (e.g. iodine) and heated in a furnace under a temperature gradient. [CHMO]
chemical vapour transport
A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. The mould is brought into contact with a rigid substrate, forming microchannels. The polymer material (in fluid form) fills these microchannels by capillary action. The polymer material is then cooled or cross-linked. [CHMO]
micromoulding in capillaries
A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of moderately low energy electrons (2 keV) is scanned across a patterned mask (held up to 50 µm from the substrate surface). The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]
A synthesis method in which the reaction outcome is determined by the use of mechanical constraints to direct reactive molecules to specific molecular sites. [CHMO]
A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (100 keV) is scanned across a patterned mask. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The electron beam can be focused using either electric or magnetic fields. [CHMO]
surface assisted chemical vapour transport
surface-assisted chemical-vapour-transport
surface assisted chemical vapor transport
surface-assisted chemical-vapor-transport
A crystal growth method for metal dichalcogenides in which the starting materials (high-purity metal and chalcogen powders) are placed in one half of a quartz ampoule together with a transport agent (e.g. iodine) and heated in a furnace under a temperature gradient. The product crystals are grown on the surface of a sheet of high-purity metal in the other half of the ampoule. [CHMO]
surface-assisted chemical vapour transport
surface-assisted chemical vapor transport
A chemical process in which a prepolymer is converted into a polymer and then into a network, upon irradiation with an electron beam. [CHMO]
A synthesis method that consists of depositing alternating monolayers of two elements onto a substrate. The deposition is self-limiting and is completed when all available chemisorption sites are occupied. Film thickness is controlled by the number of precursor cycles. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense (typically UV) light and a post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
A synthesis method in which a drop of solvent is placed on the components to be assembled and allowed to dry freely in air. The solvent evaporation causes the spontaneous association of individual components into an organised structure or pattern. [CHMO]
A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (100 keV) is scanned across a patterned mask. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The lens system used to focus the electron beam has a 4-times magnification and a 250 µm2 exposure field, and was developed by IBM and Nikon. [CHMO]
projection reduction exposure with variable axis immersion lenses
Any synthesis technique involving the transfer of a pattern to a material (a 'resist') by exposure to a radiation source (e.g. light or X-rays) or to a beam of charged particles through a mask composed of a close-packed colloidal array. Upon irradiation, the material experiences a change in its physical properties. Excess material is then removed, by a liquid 'developer' or an etching process. [CHMO]
A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (1 keV) is scanned across it in a patterned fashion. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The electron beam can be focused using either electric or magnetic fields. [CHMO]
laser assisted chemical vapour deposition
laser-assisted chemical vapour deposition
laser-induced chemical vapour deposition
laser assisted chemical vapor deposition
laser-assisted chemical vapor deposition
A synthesis method where a laser-heated substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
laser chemical vapour deposition
direct-liquid-injection chemical vapour deposition
direct-liquid-injection chemical vapor deposition
A synthesis method where the substrate is exposed to one or more liquid precursors, which react or decompose on the surface to produce a deposit. [CHMO]
direct liquid injection chemical vapour deposition
direct liquid injection chemical vapor deposition
A synthesis method where the substrate is exposed to one or more volatile precursors, at less than atmospheric pressure, which react or decompose on the surface to produce a deposit. [CHMO]
A synthesis technique where the substrate is placed in a vacuum (<10^{-4} Pa) and a metal electrode (e.g. Au, Cr, Zn or Pt) is melted and evaporated by passing a current through it. When the metal atoms hit the (much cooler) substrate they condense into nanoscale particles, forming a thin deposit on the surface. [CHMO]
A technique for growing thick (µm) epitaxial layers of SiC by heating a source (polycrystalline SiC or powder) at high temperature (1800-2600 deg. C) and low pressure in an Ar atmosphere causing it to sublime. The vapours then condense on a single crystal of SiC (the 'seed') placed a few mm away. [CHMO]
metalorganic chemical vapour deposition
organometallic chemical vapour deposition
organometallic chemical vapor deposition
A synthesis method where the substrate is exposed to volatile precursors (one of which is an organometallic compound) which react or decompose on the surface to produce a deposit. [CHMO]
metal-organic chemical vapour deposition
The deposition of a layer of silane-like molecules on a surface (e.g. glass or mica) through self-assembly. [CHMO]
silanisation
optically-induced electrokinetic patterning
Any technique that utlilises the movement of particles under the influence of an electric field (e.g. electroosmosis or electrophoresis) in conjunction with illumination of a photosensitive substrate to form a pattern. [CHMO]
optically induced electrokinetic patterning
A process for shaping pliable polymer materials using a rigid frame or model called a 'mould'. The mould is filled with a prepolymer then the whole assembly is transferred to a flat substrate where the prepolymer is cross-linked and the mould removed. [CHMO]
transfer moulding
A synthesis technique where an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. [CHMO]
The method of using hexagonally-packed water microspheres as templates for the fabrication of microporous polymer films. [CHMO]
A synthesis method which consists of depositing a monocrystalline film (from liquid or gaseous precursors) on a monocrystalline substrate of the same substance. [CHMO]
CVD (chemical vapour deposition) synthesis
chemical-vapour deposition
CVD (chemical vapor deposition) synthesis
A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
chemical vapour deposition
A synthesis method which consists of depositing an amorphous film on a monocrystalline substrate, then heating the substrate to crystallise the film. [CHMO]
Reversal of coagulation or flocculation, i.e., the dispersion of aggregates to form a colloidally stable suspension or emulsion. [CHMO]
peptisation
A process for forming thermoplastic polymer samples by dipping a mould into a solution of the polymer and particles of known dimension, and drawing off the solvent to leave a composite polymer-particle film adhering to the mould. [CHMO]
solvent casting and particulate leaching
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to two different patterns of intense (typically UV) light using two different masks. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
high-target-utilisation sputtering
A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. Ionization of the neutral gas atoms requires an external plasma (a partially ionized gas containing free electrons) source, which generates an ion beam. [CHMO]
high-target-utilisation sputter deposition
high-target-utilization sputter deposition
The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a vapour. [CHMO]
chemical vapour infiltration
superionic electrochemical nanoimprinting
A synthesis technique that uses an electrochemical reaction to transfer a pattern to a substrate. A superionic conductor (e.g. Ag2S) stamp containing the desired (nanosized) pattern on its surface is pressed onto a metal substrate. When a voltage is applied across the substrate and stamp, metal ions move from the substrate to the stamp leaving behind the complementary pattern. [CHMO]
The reaction of biomass-derived oxygenated compounds (e.g. glycerol) in aqueous solution at low temperature in the presence of a platinum catalyst to produce hydrogen. [CHMO]
The process of the settling of particles (atoms or molecules) from a gas or vapor onto a pre-existing surface, resulting in the growth of a new phase. [CHMO]
A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. A reduced image of the desired pattern is then projected on the photoresist using a microscope and the substrate is exposed to intense (typically UV) light. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]
Any method used to synthesise carbon nanotubes. [CHMO]
A method for growing low-purity polycrystalline SiC. A mixture of silica, carbon, sawdust and NaCl is heated to 2700 deg. C in a furnace, and the temperature gradually decreased. [CHMO]
2017-09-27 Curated term to align with AFO. [OSTHUS]
A method used to synthesise a sample. [CHMO]
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