AFO Synthesis Domain Ontology (WD/2025/12)
type: Ontology
imports: afo
issued: 2025-12-16T12:00:00Z
license: Creative Commons Attribution 4.0 International Public License
modified: 2025-06-25T12:00:00Z
rights: Derivative works attribution
rights: (c) 2019 Allotrope Foundation
prior version: synthesis
version info: WD/2025/12

produces
type: ObjectProperty
definition: P has output c if and only if c is a participant in p, c is present at the end of p, and c is not present at the beginning of p. [RO]

multiple-laser-beam interference lithography
type: Class
subclass of: interference lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV light generated by the interference of multiple coherent lasers. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

aluminum metallization
type: Class
subclass of: metallization
alternative label: Al metallisation
alternative label: Al metalization
alternative label: Al metallization
alternative label: aluminium metallization
alternative label: aluminum metalization
definition: The deposition of a layer of aluminium on a substrate (usually to provide electrical contacts in devices). A number of techniques may be used for metallization including evaporation and sputter coating. [CHMO]
preferred label: aluminium metallisation

reforming
type: Class
subclass of: AFP_0001348
definition: Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics). [CHMO]

Bonnemann method
type: Class
equivalent class: CHMO_0002705
subclass of: nanoparticle synthesis
alternative label: Bonnemann colloidal method
alternative label: Bonnemann's method
definition: A method for producing metal nanoparticles by the reduction of metal salts with tetraalkylammonium hydrotriorganoborates. The resulting colloids are highly active hydrogenation catalysts. [CHMO]

continuous-flow lithography
type: Class
subclass of: ultraviolet lithography
alternative label: CFL
alternative label: continuous flow lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. Shuttered pulses (30-100 ms) of mask-defined UV (365 nm) light are flashed into a continuous stream of resist inside a microchannel, leading to the formation of solid structures almost instantaneously. [CHMO]

emulsion polymerization
type: Class
subclass of: polymer preparation method
alternative label: conventional emulsion polymerisation
alternative label: conventional emulsion polymerization
definition: A polymer preparation technique in which monomer (usually acrylic) droplets are dispersed in a continuous aqueous phase and are kept colloidally stable through the use of a surfactant. [CHMO]
preferred label: emulsion polymerisation

immersion lithography
type: Class
subclass of: photolithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then immersed in a liquid with RI >1 (e.g. highly purified water) and exposed to a pattern of intense UV light. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

surface-initiated polymerization
type: Class
subclass of: polymer preparation method
alternative label: surface initiated polymerisation
alternative label: SIP
alternative label: surface initiated polymerization
definition: An experimental method used to prepare polymer samples (e.g. polymer brushes) using a surface-imobilised monomer. [CHMO]
preferred label: surface-initiated polymerisation

capillary force lithography
type: Class
subclass of: molding
alternative label: CFL
definition: A process for shaping pliable thermoplastic polymers. An elastomeric mould is placed on a polymer that has been spin-coated onto a substrate. The system is then heated above the glass transition temperature of the polymer. Capillary force allows the polymer melt to fill up the void space between the polymer and the mould. After cooling to ambient temperature, the mould is removed, generating the negative replica of the mould pattern. [CHMO]

ultrasonic gas jet deposition
type: Class
subclass of: gas jet deposition
alternative label: ultrasonic GJD
alternative label: ultrasonic JVD
alternative label: ultrasonic VJD
alternative label: ultrasonic jet vapor deposition
alternative label: ultrasonic jet vapour deposition
alternative label: ultrasonic vapor jet deposition
alternative label: ultrasonic vapour jet deposition
definition: A synthesis method where a flow of carrier gas (moving faster than the speed of sound) containing vaporised precursors is projected onto a surface, resulting in a deposit. [CHMO]

high power impulse magnetron sputter deposition
type: Class
subclass of: sputter deposition
alternative label: HIPIMS
alternative label: HPPMS
alternative label: high hower pulsed magnetron sputter deposition
alternative label: high hower pulsed magnetron sputtering
alternative label: high impact power magnetron sputter deposition
alternative label: high impact power magnetron sputtering
alternative label: high power impulse magnetron sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The ionization process uses extremely high power densities of the order of kW cm-2 in short pulses. [CHMO]

thermoplastic nanoimprint lithography
type: Class
subclass of: nanoimprint lithography
alternative label: T-NIL
definition: A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then pressed into the resist, whilst both the substrate and mould are heated to the glass transition temperature of the polymer. The resist is then cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. [CHMO]

X-ray lithography
type: Class
subclass of: lithography
alternative label: PXL
alternative label: XL
alternative label: proximity X-ray lithography
definition: A synthesis technique which uses X-rays to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of X-rays is scanned across a patterned mask. The mask consists of an X-ray absorber (e.g. Au) on a membrane that is transparent to X-rays (e.g. SiC). The X-rays induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]

lithography
type: Class
subclass of: patterning
alternative label: lithographic patterning
definition: Any synthesis technique involving the transfer of a pattern to a material (a 'resist') by selective exposure to a radiation source (e.g. light or X-rays) or to a beam of charged particles. Upon irradiation, the material experiences a change in its physical properties. Excess material is then removed, by a liquid 'developer' or an etching process. [CHMO]

pulsed laser deposition
type: Class
subclass of: physical vapor deposition
alternative label: PLA deposition
alternative label: PLD
alternative label: laser ablation growth
alternative label: pulsed laser ablation deposition
alternative label: pulsed-laser ablation deposition
alternative label: pulsed-laser deposition
definition: A synthesis technique where a high-power pulsed laser beam is focused (inside a vacuum chamber) onto a target of the desired composition. Material is then vaporized from the target ('ablation') and deposited as a thin film on a substrate facing the target. [CHMO]

platinum sputter deposition
type: Class
subclass of: sputter deposition
alternative label: Pt sputtering
alternative label: platinum sputtering
definition: A synthesis technique where a Pt metal target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin film of Pt, on a substrate. [CHMO]

rapid thermal chemical vapor deposition
type: Class
subclass of: thermal chemical vapor deposition
alternative label: RTCVD
alternative label: rapid thermal CVD
change note: 2016-02-03 Switched labels [OSTHUS]
definition: A synthesis method where a rapidly heated substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: rapid thermal chemical vapour deposition

crystal growth method
type: Class
subclass of: deposition
definition: Any synthesis method used to grow crystals. [CHMO]

polymer synthesis
type: Class
equivalent class: CHMO_0002213
subclass of: AFP_0001348
subclass of: Restriction
  on property: produces
  some values from: CHEBI_60027
alternative label: polymer synthesis method
definition: Any method used to prepare a polymer. [CHMO]

Lely method
type: Class
subclass of: crystal growth method
alternative label: Lely technique
definition: A method for crystal growth where polycrystalline SiC lumps are carefully packed between two concentric graphite tubes. The inner tube is then withdrawn leaving a porous SiC layer inside the outer tube. The outer tube is then heated (~2500 deg. C) in Ar, causing the SiC powder to sublime and nucleate on a cooler surface. [CHMO]

ultrasound-assisted polyol method
type: Class
subclass of: polyol method
alternative label: ultrasonically-assisted polyol method
definition: The synthesis of metal-containing compounds in poly(ethylene glycol) which is irradiated with ultrasonic (>20 kHz) waves. The ethylene glycols act as both the solvent and reducing agent. [CHMO]

melt spinning
type: Class
subclass of: spinning
alternative label: melt-spinning
definition: A process used to create polymer fibers. Molten polymer is forced through a spinneret (a multi-pored device similar to a shower head) and cooled to form multiple continuous filaments. [CHMO]

hybrid physical-chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: HPCVD
definition: A synthesis method that involves both the chemical decomposition of a precursor gas and the vaporization of a solid source e.g. the growth of MgB2 involves both diborane gas and solid Mg. [CHMO]
preferred label: hybrid physical-chemical vapour deposition

two-step UV-assisted capillary force lithography
type: Class
subclass of: UV-assisted capillary force lithography
alternative label: two-step UV-assisted CFL
alternative label: two-step UV-assisted capillary force lithography (CFL)
definition: A process for shaping pliable thermoplastic polymers. An elastomeric (polyurethane acrylate) mould is placed on a UV-curable polymer that has been spin- or drop-coated onto a substrate and partially cured using UV light (200-400 nm). Capillary force allows the polymer melt to fill up the void space between the polymer and the mould, generating a negative replica of the mould pattern. The process is repeated with a second mould and exposure to UV light. Two-step UV-assisted capillary force lithography is used to generate micro/nanoscale combined hierarchical structures. [CHMO]

single-metal deposition
type: Class
subclass of: electroless metal deposition
alternative label: SMD
definition: A development method where the substrate is first immersed in a colloidal gold solution (containing negatively charged gold particles) at low pH. Gold subsequently deposits on any organic molecules containing postively charged groups at this pH. In the second step, the surface is treated with another solution containing gold chloride and hydroxylamine which causes the reduction of gold ion, producing a further gold deposit on the exisiting gold layer. Single-metal deposition is used to enhance latent fingermarks. [CHMO]

block copolymer micelle nanolithography
type: Class
subclass of: nanolithography
definition: A synthesis technique involving the transfer of a nanosized pattern to a material using a micelle solution of a block copolymer. A glass or silicon substrate is dipped into the solution, retrieved, and the solvent is allowed to evaporate in air. A plasma treatment (O2, H2 or Ar) is performed to remove the polymer shell leaving a pattern. [CHMO]

Brust method
type: Class
equivalent class: CHMO_0002629
subclass of: nanoparticle synthesis
alternative label: Brust nanoparticle synthesis
alternative label: Brust synthesis
definition: A method for synthesising gold nanoparticles from HAuCl4 in non-aqueous solution (e.g. toluene) using tetraoctylammonium bromide as a phase-transfer catalyst and sodium borohydride to reduce Au(III) to Au(0). [CHMO]

micropen lithography
type: Class
subclass of: deposition
alternative label: MPL
alternative label: micro-pen lithography
definition: A synthesis method where a pattern or ink layer is dpolymern on a substrate using a liquid dispensed through a microsized conical nozzle. The movement of the 'micropen' is controlled by a computer program. [CHMO]

metal-organic molecular beam epitaxy
type: Class
subclass of: molecular beam epitaxy
alternative label: MOMBE
alternative label: metal-organic MBE
definition: A synthesis method which consists of depositing a monocrystalline film (from a molecular beam of organometallic precursors) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]

nanotransfer molding
type: Class
subclass of: transfer molding
alternative label: nTM
alternative label: nano TM
alternative label: nano-transfer molding
alternative label: nano-transfer moulding
alternative label: nanotransfer moulding
change note: 2016-02-03 Switched labels [OSTHUS]
definition: A process for shaping pliable polymer materials using a nanosized rigid frame or model called a 'mould'. The mould is filled with a prepolymer then the whole assembly is transferred to a flat substrate where the prepolymer is cross-linked and the mould removed. [CHMO]

thermal curing
type: Class
subclass of: curing
alternative label: thermocuring
definition: A chemical process in which a prepolymer is converted into a polymer and then into a network, upon application of heat. [CHMO]

injection molding
type: Class
subclass of: molding
definition: A process for shaping pliable thermoplastic or thermosetting plastics using a rigid frame or model called a 'mould'. The plastic is fed into a heated barrel, mixed, and forced into a mould where it cools and hardens to the configuration of the mould. [CHMO]
preferred label: injection moulding

Pickering emulsion method
type: Class
subclass of: emulsification
alternative label: Pickering emulsification
alternative label: Pickering emulsion process
alternative label: Pickering emulsion processing
definition: A method for dispersing two or more immiscible liquid by shaking, stirring or homogenising the mixture. The emulsion is stablised by adding finely divided insoluble solid particles (e.g. latex or silica). [CHMO]

electrospinning
type: Class
subclass of: spinning
alternative label: electro-spinning
definition: A process used to created very fine (µm or nm scale) fibres from a liquid. A high voltage is applied to a droplet of the liquid sample which is drawn out into fibres and cooled in air. [CHMO]

reactive sputter deposition
type: Class
subclass of: sputter deposition
alternative label: reactive sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then react with a gas that is introduced into the chamber and the products deposit, as a thin-film, on a substrate. [CHMO]

ion projection lithography
type: Class
subclass of: ion-beam lithography
alternative label: IPL
alternative label: ion-projection lithography
definition: A synthesis technique that uses ions to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a focused ion beam (75 keV He ions) is scanned across a patterned mask inducing chemical reactions in the resist. The desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]

photo nanoimprint lithography
type: Class
subclass of: nanoimprint lithography
alternative label: P-NIL
definition: A synthesis technique that uses mechanical deformation and cross-linking to transfer a pattern to a substrate. A solution of photosensitive resist (a polymer) is deposited on the substrate by spin coating. A transparent stamp (e.g. fused silica) containing the desired (nanosized) pattern on its surface is then pressed into the resist, which is exposed to UV light. Any unexposed areas of polymer are removed by reactive ion etching. [CHMO]

glow discharge synthesis
type: Class
subclass of: AFP_0001159
subclass of: AFP_0001348
definition: A synthesis method where an electrical discharge is passed under reduced pressure between two electrodes. [CHMO]

phase inversion technique
type: Class
subclass of: polymer synthesis
alternative label: phase inversion method
alternative label: phase inversion precipitation technique
alternative label: phase-inversion method
alternative label: phase-inversion technique
definition: Any method for the synthesis of polymer membranes that involves the polymer transforming from the liquid phase of the cast solution to the solid phase. [CHMO]

gas-phase infiltration
type: Class
subclass of: infiltration
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a gas. [CHMO]

microemulsion polymerization
type: Class
subclass of: miniemulsion polymerization
alternative label: micro-emulsion polymerisation
alternative label: micro-emulsion polymerization
definition: A polymer preparation technique in which monomer (usually acrylic) <100 nm droplets are dispersed in a continuous aqueous phase and are kept colloidally stable through the use of a surfactant and a cosurfactant e.g. hexanol. [CHMO]
preferred label: microemulsion polymerisation

pressure-pulsed chemical vapor infiltration
type: Class
subclass of: chemical vapor infiltration
alternative label: P-CVI
alternative label: pressure pulsed CVI
alternative label: pressure-pulsed CVI
alternative label: pressure-pulsed chemical vapour infiltration
change note: 2016-02-03 Added altLabel [OSTHUS]
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a vapour which is applied as a series of high pressure pulses. This results in a multilayer structure. [CHMO]

hot wire chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: HFCVD
alternative label: HWCVD
alternative label: cat-CVD
alternative label: catalytic CVD
alternative label: catalytic chemical vapor deposition
alternative label: catalytic chemical vapour deposition
alternative label: hot filament CVD
alternative label: hot filament chemical vapor deposition
alternative label: hot filament chemical vapour deposition
alternative label: hot wire CVD
alternative label: hot wire chemical vapour deposition
change note: 2016-02-03 Switched labels [OSTHUS]
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose (catalysed by a hot filament) on the surface to produce a deposit. [CHMO]

polyol method
type: Class
subclass of: colloid synthesis
alternative label: polyol process
definition: The synthesis of metal-containing compounds in poly(ethylene glycol)s. The ethylene glycol acts as both the solvent and reducing agent. [CHMO]

contact lithography
type: Class
subclass of: ultraviolet lithography
alternative label: contact printing
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. A mask ('photomask') with the desired pattern is then placed in contact with the substrate and both are exposed to intense UV light. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

jet deposition
type: Class
subclass of: deposition
alternative label: JD
definition: A synthesis method where a flow of precursors is projected onto a surface, resulting in a deposit. [CHMO]

multi-layer micromolding
type: Class
subclass of: micromolding
alternative label: MMM
alternative label: multi layer micromolding
alternative label: multi layer micromoulding
alternative label: multi-layer micromoulding
change note: 2016-02-03 Switched labels [OSTHUS]
definition: A process for shaping pliable polymer material using multiple microsized rigid frames or models called 'moulds'. The polymer material (in liquid form) is injected into a mould using a small diameter piston and then allowed to harden or set inside the mould, adopting its shape. [CHMO]

ultraviolet lithography
type: Class
subclass of: photolithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV light and a post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

nanolithography
type: Class
subclass of: lithography
definition: Any synthesis technique involving the transfer of a nanosized pattern to a material. [CHMO]

lock-release lithography
type: Class
subclass of: ultraviolet lithography
alternative label: LRL
alternative label: lock release lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. Shuttered pulses (30-100 ms) of mask-defined UV (365 nm) light are flashed into a stationery layer of monomer inside microchannel. Objects generated by this process are 'locked' by relief structures in the channel, before being flushed out. The process is then repeated in a cyclic manner. [CHMO]

vacuum metal deposition
type: Class
subclass of: metal evaporation
alternative label: VMD
alternative label: vacuum-metal deposition
definition: A development technique where the substrate is placed in a vacuum (10^{-4} Pa) and two metal electrodes are melted and evaporated (sequentionally) by passing a current through them. When the metal atoms hit the (much cooler) substrate they condense into nanoscale particles, forming a thin deposit on the surface. When vacuum metal deposition is used to enhance latent fingermarks on polymer surfaces, a Au layer is applied first, followed by a much thicker Zn layer (which does not deposit on the fingermark ridges). [CHMO]

atomic layer chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: atomic-layer chemical vapour deposition
alternative label: ALCVD
alternative label: atomic layer CVD
alternative label: atomic-layer CVD
alternative label: atomic-layer chemical vapor deposition
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a monolayer deposit. The surface reaction is self-limiting resulting in a nanometre thickness of film. [CHMO]
preferred label: atomic layer chemical vapour deposition

thin-film deposition
type: Class
subclass of: deposition
alternative label: thin film deposition
definition: Any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. [CHMO]

electron-beam sputter deposition
type: Class
subclass of: sputter deposition
alternative label: e-beam sputtering
alternative label: e-beam sputtering deposition
alternative label: electron beam sputtering
alternative label: electron sputter deposition
alternative label: electron-beam sputtering
definition: A synthesis technique where a solid target is bombarded with electrons causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [CHMO]

particle-beam lithography
type: Class
subclass of: lithography
definition: A type of lithography where electrons or ions are used to generate pattern, which is transferred to a resist. [CHMO]

plasma sputter deposition
type: Class
subclass of: sputter deposition
alternative label: plasma sputter coating
alternative label: plasma sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. Ionization of the neutral gas atoms requires a plasma (a partially ionized gas containing free electrons) source to be generated by passing an electrical discharge through the chamber, with the target acting as the cathode. [CHMO]

laser vaporization method
type: Class
subclass of: carbon nanotube synthesis method
alternative label: laser furnace method
definition: A method for the synthesis of carbon nanotubes where a laser beam (typically a YAG laser) is focused onto a graphite-metal target located in a quartz tube surrounded by a furnace. The target is vaporised in high temperature Ar gas producing single-walled and double-walled carbon nanotubes which are collected at a trap. [CHMO]
preferred label: laser vaporisation method

directed self-assembly
type: Class
subclass of: self-assembly
alternative label: DSA
alternative label: DSL
alternative label: directed self assembly
alternative label: directional self assembly
alternative label: directional self-assembly
definition: A synthesis method in which the components of the sample spontaneously (and reversibly) associate by non-covalent interactions, taking the form of an existing lithographically templated structure or pattern. [CHMO]

lithographically induced self-assembly
type: Class
subclass of: thermoplastic nanoimprint lithography
alternative label: LISA
alternative label: lithographically-induced self-assembly
definition: A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then held above the resist, whilst both the substrate and mould are heated to the glass transition temperature of the polymer. The resist is then cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. During the heat-cool cycle the initially flat polymer film self-assembles into periodic supramolecular pillar arrays. [CHMO]

rapid electrokinetic patterning
type: Class
subclass of: optically induced electrokinetic patterning
alternative label: REP
definition: A technique that utlilises the movement of particles under the influence of an electric field (e.g. electroosmosis or electrophoresis) in conjunction with illumination of a photosensitive substrate to form a pattern. Particles suspended in DI water are placed between two parallel ITO electrodes biased with an AC signal. Light of wavelength 1064 nm is used to heat the fluid sample and induce an electrohydrodynamic microvortex, bringing the particles towards its centre, forming a pattern. [CHMO]

hydride vapor-phase epitaxy
type: Class
subclass of: vapor-phase epitaxy
alternative label: hydride vapour phase epitaxy
alternative label: HVPE
alternative label: hydride vapor phase epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film, from vapour-phase precursors (in hydrogen or ammonia carrier gases), on a monocrystalline substrate. [CHMO]
preferred label: hydride vapour-phase epitaxy

solvent vapor annealing
type: Class
subclass of: polymer synthesis
alternative label: SVA
change note: 2016-02-03 Switched labels [OSTHUS]
change note: 2016-02-25 fixed translation [OSTHUS]
definition: A method applied to polymer films to increase polymer chain mobility. The film is exposed to a solvent atmosphere at room-temperature causing it to swell. [CHMO]
preferred label: solvent vapour annealing

steam reforming
type: Class
subclass of: thermal reforming
alternative label: SR
alternative label: hydrogen reforming
definition: The reaction of hydrocarbons with steam at high temperature (700-1000 deg. C) in order to produce hydrogen. [CHMO]

multi-metal deposition
type: Class
subclass of: electroless metal deposition
alternative label: MMD
alternative label: multi-metal-deposition
alternative label: multimetal deposition
definition: A development method where the substrate is first immersed in a colloidal gold solution (containing negatively charged gold particles) at low pH. Gold subsequently deposits on any organic molecules containing postively charged groups at this pH. In the second step, the surface is treated with a solution containing silver acetate and hydroquinone which causes the reduction of silver ions, producing a silver deposit on the exisiting gold layer. Multi-metal deposition is used to enhance latent fingermarks. [CHMO]

sputter deposition
type: Class
subclass of: physical vapor deposition
alternative label: sputter coating
alternative label: sputtering
definition: A synthesis technique where a solid target is bombarded with electrons or energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [CHMO]

rotational molding
type: Class
subclass of: molding
alternative label: rotomoulding
alternative label: rotomolding
definition: A process for shaping pliable thermoplastic or thermosetting plastics using a rigid frame or model called a 'mould'. The plastic is placed in a heated mould, which is slowly rotated causing the melted plastic to flow into to the mould and stick to its walls. [CHMO]
preferred label: rotational moulding

dry spinning
type: Class
subclass of: spinning
definition: A process used to create polymer fibers. Polymer dissolved in a solvent is forced through a spinneret (a multi-pored device similar to a shower head) and the solvent is removed from the polymer fibres by evaporation. [CHMO]

photoelectrochemical deposition
type: Class
subclass of: electrochemical deposition
definition: A synthesis method in which a film of solid metal is deposited from a solution of ions onto an electrically conducting surface (an electrode). Three electrodes are required (working, counter and reference) and when sufficient current is passed through the solution, accompanied by irradiation with UV light, metal ions are reduced at the working electrode. [CHMO]

hydrogen arc-discharge method
type: Class
subclass of: arc-discharge method
alternative label: H2 arc discharge method
alternative label: H2 dc arc-discharge method
alternative label: hydrogen arc discharge method
alternative label: hydrogen direct current arc-discharge method
alternative label: hydrogen direct-current arc discharge
alternative label: hydrogen direct-current arc-discharge method
definition: A method for the synthesis of carbon nanotubes where a direct-current arc voltage is applied across two graphite electrodes immersed in H2 gas. When pure graphite rods are used, fullerenes are deposited as soot inside the chamber, and multi-walled carbon nanotubes are deposited on the cathode. When a graphite anode containing a metal catalyst (Fe or Co) is used with a pure graphite cathode single-walled carbon nanotubes are generated in the form of soot. [CHMO]

deep-ultraviolet lithography
type: Class
subclass of: ultraviolet lithography
alternative label: deep ultraviolet lithography
alternative label: deep-UV lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV (240 nm) light and a post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

Bridgeman technique
type: Class
subclass of: crystal growth method
alternative label: Bridgman technique
alternative label: Bridgman-Stockbarger technique
definition: A method of growing a single crystal 'ingot' or 'boule'. The polycrystalline sample is heated in a container above its melting point and slowly cooled from one end where a seed crystal is located. Single crystal material is then progressively formed along the length of the container. [CHMO]

liquid polymer infiltration
type: Class
subclass of: infiltration
alternative label: LPI
alternative label: PIP
alternative label: polymer infiltration and pyrolysis
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with polymer precursors. [CHMO]

step-and-flash imprint lithography
type: Class
subclass of: photo nanoimprint lithography
alternative label: SFIL
alternative label: step and flash imprint lithography
definition: A synthesis technique that uses mechanical deformation and cross-linking to transfer a pattern to a substrate. A solution of photosensitive organosilicon resist (a polymer) is deposited on the substrate by spin coating. A transparent stamp (e.g. quartz) containing the desired (nanosized) pattern on its surface is then pressed into the resist, which is exposed to UV light. Any unexposed areas of polymer are removed by reactive ion etching. [CHMO]

thermal reforming
type: Class
subclass of: reforming
definition: Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics) by exposing the hydrocarbons to high pressures and temperatures. [CHMO]

photochemical curing
type: Class
subclass of: curing
alternative label: photocuring
definition: A chemical process in which a prepolymer is converted into a polymer and then into a network, upon irradiation with light. [CHMO]

plasma jet deposition
type: Class
subclass of: jet deposition
alternative label: plasma JD
definition: A synthesis method where a plasma (a partially ionized gas containing free electrons) containing precursors is projected onto a surface, resulting in a deposit. [CHMO]

seeded sublimation
type: Class
subclass of: crystal growth method
alternative label: modified Lely method
alternative label: seed sublimation
alternative label: seeded sublimation method
alternative label: seeded sublimation technique
alternative label: seeded-sublimation growth technique
alternative label: seeded-sublimation method
alternative label: seeded-sublimation technique
definition: A technique for growing crystals of SiC by heating a source (polycrystalline SiC or powder) at high temperature (1800-2600 deg. C) and low pressure in an Ar atmosphere causing it to sublime. The vapours then condense on a single crystal of SiC (the 'seed'). [CHMO]

solvent casting
type: Class
subclass of: polymer synthesis
definition: A process for forming thermoplastic polymer samples by dipping a mould into a solution of the polymer and drawing off the solvent to leave a polymer film adhering to the mould. [CHMO]

gas-source molecular beam epitaxy
type: Class
subclass of: molecular beam epitaxy
alternative label: CBE
alternative label: chemical beam epitaxy
alternative label: chemical-beam epitaxy
alternative label: gas source MBE
alternative label: gas source molecular beam epitaxy
alternative label: gas-source MBE
definition: A synthesis method which consists of depositing a monocrystalline film (from a molecular beam of reactive gases) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]

catalytic steam reforming of ethanol
type: Class
subclass of: catalytic steam reforming
alternative label: ethanol steam reforming
definition: The reaction of ethanol with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]

microcontact printing
type: Class
subclass of: soft lithography
alternative label: mCP
alternative label: micro CP
alternative label: micro contact printing
alternative label: micro-contact printing
definition: A synthesis method for transferring a pattern to a gold surface. A PDMS stamp is coated in an alkanethiol and then brought into contact with a gold surface. Thiol from the wet region generates patterned features of SAMs on the gold surface. [CHMO]

near-field phase shift lithography
type: Class
subclass of: lithography
alternative label: NFPSL
alternative label: near field optical lithography
alternative label: near field phase shift lithography
alternative label: near field photolithography
alternative label: near-field conformational photolithography
alternative label: near-field optical lithography
alternative label: near-field phase-shift lithography
alternative label: near-field photolithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. A transparent PDMS mask with the desired pattern (in relief) on its surface is placed in contact with the photoresist layer. UV light (300-460 nm) is then used to cross-link the polymer. Light passing through the stamp is modulated in the near-field by the relief of the mask such that the edges of the relief structures correspond to nulls in the intensity of the light. The polymer is cross-linked in the remaining areas. [CHMO]

temperature-gradient chemical vapor infiltration
type: Class
subclass of: chemical vapor infiltration
alternative label: temperature gradient chemical vapour infiltration
alternative label: TG-CVI
alternative label: temperature gradient CVI
alternative label: temperature gradient chemical vapor infiltration
alternative label: temperature-gradient CVI
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from a vapour, accelerated by a temperature gradient. [CHMO]
preferred label: temperature-gradient chemical vapour infiltration

microtransfer molding
type: Class
subclass of: transfer molding
alternative label: micro-transfer moulding
alternative label: micro TM
alternative label: micro-transfer molding
definition: A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. The mould is filled with a prepolymer then the whole assembly is transferred to a flat substrate where the prepolymer is cross-linked and the mould removed. [CHMO]
preferred label: microtransfer moulding

ion-assisted deposition
type: Class
subclass of: sputter deposition
alternative label: IAD
alternative label: IBAD
alternative label: ion beam assisted deposition
alternative label: ion-beam-assisted deposition
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'), which deposit, as a thin-film, on a substrate. A secondary ion beam is then used to remove any partially bound atoms from the substrate surface. [CHMO]

thermal evaporation
type: Class
subclass of: physical vapor deposition
alternative label: TE
alternative label: evaporative deposition)
alternative label: filament evaporation
alternative label: thermal deposition
alternative label: vacuum condensation
alternative label: vacuum thermal evporation
definition: A synthesis technique where the material to be deposited is heated until evaporation in a vacuum (<10^{-4} Pa) and eventually deposits as a thin film by condensing on a (cold) substrate. [CHMO]

colloid synthesis
type: Class
subclass of: AFP_0001348
subclass of: Restriction
  on property: produces
  some values from: AFM_0001044
alternative label: colloid method
definition: Any method for the synthesis or processing of colloids (mixtures where one substance is dispersed evenly throughout another). [CHMO]

microlithography
type: Class
subclass of: lithography
definition: Any synthesis technique involving the transfer of a microsized pattern to a material (a 'resist') by selective exposure to a radiation source (e.g. light or X-rays) or to a beam of charged particles. Upon irradiation, the material experiences a change in its physical properties which changes its response to a developer solution (making it either soluble or insoluble). The desired pattern is then obtained by removing any excess resist with the developer. [CHMO]

soft lithography
type: Class
subclass of: lithography
definition: Any synthesis technique which uses elastomeric stamps, moulds, and conformable photomasks prepared from liquid polymer precursors. [CHMO]

molecular beam epitaxy
type: Class
subclass of: epitaxy
alternative label: MBE
alternative label: molecular-beam epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film (from a molecular beam) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]

plasma-assisted chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: plasma assisted chemical vapour deposition
alternative label: plasma-enhanced chemical vapour deposition
alternative label: PACVD
alternative label: PECVD
alternative label: plasma assisted CVD
alternative label: plasma assisted chemical vapor deposition
alternative label: plasma enhanced CVD
alternative label: plasma-assisted CVD
alternative label: plasma-enhanced CVD
alternative label: plasma-enhanced chemical vapor deposition
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, in the presence of a plasma (a partially ionized gas, containing free electrons), which react or decompose on the surface to produce a deposit. The plasma enhances the rate of reaction on the substrate surface. [CHMO]
preferred label: plasma-assisted chemical vapour deposition

autothermal reforming
type: Class
subclass of: thermal reforming
alternative label: ATR
definition: The reaction of hydrocarbons with oxygen and carbon dioxide at 950-1100 deg. C to form syngas. [CHMO]

thermal chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: TCVD
alternative label: thermal CVD
definition: A synthesis method where a substrate is placed in a heated atmosphere (600-800 deg. C) and exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: thermal chemical vapour deposition

compression molding
type: Class
subclass of: molding
change note: 2016-02-03 Switched labels [OSTHUS]
change note: 2016-02-25 fix translation [OSTHUS]
definition: A process for shaping pliable polymer material using a rigid frame or model called a 'mould'. The pre-heated material is first placed in an open, heated mould which is then closed before pressure is applied to it. The applied pressure forces the softened polymer to adopt the shape of the mould. [CHMO]
preferred label: compression moulding

reactive spray deposition
type: Class
subclass of: deposition
alternative label: RSD
alternative label: flame-assisted deposition
definition: A synthesis technique where a metal-containing precursor, dissolved in a solvent, is atomised and ignited. During combustion the flame is directed at the substrate resulting in the deposition of a thin layer of metal. [CHMO]

hydrothermal synthesis
type: Class
subclass of: AFP_0001348
alternative label: hydrothermal method
alternative label: hydrothermal process
alternative label: hydrothermal reaction
definition: A synthesis method for growing single crystals from an aqueous solution in an autoclave (a thick-walled steel vessel) at high temperature (400 deg. C) and pressure. [CHMO]

pulsed laser polymerization
type: Class
subclass of: polymer preparation method
alternative label: pulsed-laser polymerisation
alternative label: PLP
alternative label: pulsed-laser polymerization
definition: A polymerization which is initiated by laser pulses at a constant repetition rate. [CHMO]
preferred label: pulsed laser polymerisation

ion-beam lithography
type: Class
subclass of: particle-beam lithography
alternative label: ion beam lithography
definition: A synthesis technique that uses ions to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a focused ion beam (75 keV He ions) is scanned across it in a patterned fashion. The ions induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]

curing
type: Class
definition: A chemical process in which a prepolymer or polymer is converted into a polymer of higher molar mass and then into a network. [CHMO]

interference lithography
type: Class
subclass of: photolithography
alternative label: HIL
alternative label: holographic interference lithography
alternative label: holographic lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense UV light generated by the interference of two or more coherent light sources. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

microwave plasma-assisted chemical vapor deposition
type: Class
subclass of: plasma-assisted chemical vapor deposition
alternative label: MPCVD
alternative label: microwave plasma assisted CVD
alternative label: microwave plasma enhanced CVD
alternative label: microwave plasma-assisted CVD
alternative label: microwave plasma-enhanced CVD
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, in the presence of a microwave-induced plasma (a partially ionized gas containing free electrons), which react or decompose on the surface to produce a deposit. The plasma enhances the rate of reaction on the substrate surface. [CHMO]
preferred label: microwave plasma-assisted chemical vapour deposition

arc-discharge method
type: Class
subclass of: carbon nanotube synthesis method
alternative label: arc discharge method
alternative label: arc method
alternative label: arc-evaporation of graphite
alternative label: dc arc-discharge method
alternative label: direct current arc-discharge method
alternative label: direct-current arc-discharge method
definition: A method for the synthesis of carbon nanotubes where a direct-current arc voltage is applied across two graphite electrodes immersed in an inert gas such as He. When pure graphite rods are used, fullerenes are deposited as soot inside the chamber, and multi-walled carbon nanotubes are deposited on the cathode. When a graphite anode containing a metal catalyst (Fe or Co) is used with a pure graphite cathode single-walled carbon nanotubes are generated in the form of soot. [CHMO]

unmixed reforming
type: Class
subclass of: catalytic steam reforming
alternative label: UMR
definition: The reaction of natural gas or syngas with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. The nickel catalyst is then oxidised with air and finally reduced back to the metal using more hydrocarbon gas. [CHMO]

layer-by-layer assembly
type: Class
subclass of: AFP_0001640
alternative label: ESA
alternative label: ESD
alternative label: LBL
alternative label: LBL assembly
alternative label: LbL
alternative label: LbL assembly
alternative label: electrostatic self-assembly
alternative label: electrostatic self-assembly deposition
alternative label: layer-by-layer adsorption
definition: A synthesis method in which thin films of oppositely charged layers are deposited in sequence. Positive or negative charged species are adsorbed onto the sample surface by dipping the substrate into solutions. The excess solution, after each adsorption step, is rinsed with solvent. [CHMO]

reverse micelle polymerization
type: Class
subclass of: polymer preparation method
definition: A polymerization process where the hydrophilic monomer is solubilised inside surfactant reverse micelle structures. [CHMO]
preferred label: reverse micelle polymerisation

carbo-reduction
type: Class
alternative label: carbo reduction
alternative label: carboreduction
definition: A process in which a metal oxide is reduced in the presence of carbon or a carbon-containing compound. [CHMO]

molecular self assembly
type: Class
subclass of: self-assembly
alternative label: molecular self-assembly
change note: 2016-02-03 Fixed typo [OSTHUS]
definition: A process where molecules spontaneously adopt a defined arrangement. [CHMO]

dry-wet phase inversion technique
type: Class
subclass of: phase inversion technique
alternative label: Loeb-Sourirajan method
alternative label: Loeb-Sourirajan technique
definition: A technique for preparing a polymer membrane by mixing polymer and solvent, then casting this solution onto a surface and allowing the solvent to partially evaporate. The film is them immersed in a nonsolvent causing solidification. [CHMO]

suspension polymerization
type: Class
subclass of: polymer preparation method
definition: Any experimental method used to prepare polymer samples where the monomer is suspended as liquid droplets in a continuous water phase by means of strong agitation and the presence of a suspending agent. [CHMO]
preferred label: suspension polymerisation

electrochemical catalytic reforming
type: Class
subclass of: catalytic reforming
alternative label: ECR
definition: Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics) in the presence of a metal catalyst and under a high pressure of H2 gas. An electric current is used to heat the catalyst. [CHMO]

chemical solution deposition
type: Class
subclass of: deposition
alternative label: CBD
alternative label: CSD
alternative label: chemical bath deposition
alternative label: chemical deposition
alternative label: chemical-bath deposition
alternative label: chemical-solution deposition
definition: The process of the settling of particles (atoms or molecules) from a solution or suspension onto a pre-existing surface, resulting in the growth of a new phase. [CHMO]

ultraviolet curing
type: Class
subclass of: photochemical curing
alternative label: UV curing
alternative label: UV irradiation curing
alternative label: UV-assisted curing
definition: A chemical process in which a prepolymer is converted into a polymer and then into a network, upon irradiation with light in the range 190-400 nm. [CHMO]

microemulsion method
type: Class
subclass of: emulsification
alternative label: microemulsion methods
alternative label: microemulsion technique
definition: A method for dispersing two or more immiscible liquids as µm-sized droplets by shaking, stirring or homogenising the mixture. [CHMO]

co-assembly
type: Class
subclass of: AFP_0001640
alternative label: Co-assembly
alternative label: coassembly
definition: The process of two individual components of a sample associating to form a new pattern or structure. [CHMO]

gel spinning
type: Class
subclass of: spinning
alternative label: dry-wet spinning
definition: A process used to create polymer fibers. Polymer in a gel state is forced through a spinneret (a multi-pored device similar to a shower head). The fibres are then air dried and cooled in a liquid bath. [CHMO]

graphitization
type: Class
equivalent class: CHMO_0002609
equivalent class: Class
  intersection of: AFP_0001348
  intersection of: Restriction
    on property: produces
    some values from: CHEBI_33418
subclass of: AFP_0001348
definition: The conversion of an organic material in an inert atmosphere at temperatures in excess of 1800 °C to produce a graphite crystal structure. [CHMO]
preferred label: graphitisation

supercritical spray deposition
type: Class
subclass of: deposition
alternative label: supercritical fluid molecular spray film deposition
definition: A synthesis method where a solid material is dissolved in a supercritical fluid (at elevated pressure) which is forced through a small orifice into a region of relatively low pressure. This produces a molecular spray which is directed against a substrate where it deposits as a thin film. [CHMO]

electrophoretic deposition
type: Class
subclass of: deposition
alternative label: EPD
definition: Any synthesis process where colloidal particles suspended in a liquid medium migrate under the influence of an electric field and are deposited on an electrode. [CHMO]

barrel sputter deposition
type: Class
subclass of: sputter deposition
alternative label: barrel sputtering
alternative label: barrel-sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The substrate is held in a barrel which is swung from side-to-side to ensure even deposition. [CHMO]

forced-flow chemical vapor infiltration
type: Class
subclass of: chemical vapor infiltration
alternative label: forced-flow CVI
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from a vapour held at high pressure. [CHMO]
preferred label: forced-flow chemical vapour infiltration

wire electrical explosion method
type: Class
equivalent class: CHMO_0002476
subclass of: nanoparticle synthesis
alternative label: EEW
alternative label: EEW method
alternative label: WEE
alternative label: WEE method
alternative label: electrical explosion of wire
alternative label: electrical explosion of wire method
definition: A synthesis method for metal nanopowders that consists of passing a pulse of a high-density current (104-n106 A/mm2) through a wire causing the explosive disintegration of the metal (accompanied by a bright flash of light, a shock wave, the dispersion of the metal, and the fast expansion of a mixture of boiling metal droplets and vapour to the surrounding medium) and the production of metal , particles with characteristic sizes of tens of µm to a few nm. [CHMO]

template-directed synthesis
type: Class
subclass of: AFP_0001348
alternative label: supramolecular assistance to covalent synthesis
alternative label: template-directed covalent synthesis
definition: A synthesis method which relies on the use of reversible noncovalent bonding interactions between molecular building blocks in order to preorganise them into a certain relative geometry as a prelude to covalent bond formation. [CHMO]

laser-assisted direct imprint lithography
type: Class
subclass of: nanoimprint lithography
alternative label: LADI
alternative label: laser assisted direct imprint
alternative label: laser assisted direct imprint lithography
alternative label: laser assisted direct imprinting
alternative label: laser-assisted direct imprint
alternative label: laser-assisted direct imprinting
definition: A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of photosensitive resist (a polymer) is deposited on a silicon substrate by spin coating. A transparent stamp (e.g. quartz) containing the desired (nanosized) pattern on its surface is then pressed into the resist and a single laser pulse (XeCl excimer laser) is applied to melt the top layer of silicon. The molten silicon flows into the pattern then rapidly solidifies. [CHMO]

spinning
type: Class
subclass of: AFP_0000451
subclass of: polymer preparation method
definition: A process used to create polymer fibers using a spinneret (a multi-pored device similar to a shower head) to form multiple continuous filaments. [CHMO]

scanning probe lithography
type: Class
subclass of: AFP_0001348
alternative label: SPL
definition: Any synthesis technique where a scanning probe microscope is used to pattern surfaces either constructively (by depositing a substance) or destructively (by etching a pattern in a surface). [CHMO]

catalytic reforming
type: Class
subclass of: reforming
definition: Any process in which the molecular structure of a hydrocarbon is rearranged to alter its properties (e.g. its combustion characteristics) in the presence of a catalyst and under a high pressure of H2 gas. [CHMO]

solid-source molecular beam epitaxy
type: Class
subclass of: molecular beam epitaxy
alternative label: solid source MBE
alternative label: solid-source MBE
alternative label: solid-source molecular-beam epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film (from a beam of evapourated metal particles) on a monocrystalline substrate under high vacuum (<10^{-8} Pa). Molecular beam epitaxy is very slow, with a deposition rate of <1000 nm per hour. [CHMO]

photodeposition
type: Class
subclass of: deposition
alternative label: PD
definition: A synthesis technique where a monomer is irradiated with UV light, causing cross-linking and the deposition of a polymer film on a substrate. [CHMO]

sol-gel template synthesis
type: Class
subclass of: sol-gel method
alternative label: sol-gel template synthesis method
alternative label: sol-gel templating
definition: The process of the settling of (nm sized) particles from a colloidal suspension onto a pre-existing surface, resulting in a ceramic thin film. The desired solid particles (e.g. metal alkoxides) are suspended in a liquid, forming the 'sol', which is deposited on a membrane template or mould by spinning, dipping or coating, The particles in the sol are polymerised by partial evaporation of the solvent, or addition of an initiator, forming the 'gel', which is then heated at high temperature to give the final solid product. [CHMO]

multi-layer soft lithography
type: Class
subclass of: soft lithography
alternative label: MSL
alternative label: multi layer soft lithography
definition: Any synthesis technique which uses elastomeric stamps, molds, and conformable photomasks prepared from multiple liquid polymer precursors. [CHMO]

electron-beam-induced deposition
type: Class
subclass of: physical vapor deposition
alternative label: EB deposition
alternative label: EBD
alternative label: EBID
alternative label: electron beam deposition
alternative label: electron beam-induced deposition
alternative label: electron-beam deposition
definition: A synthesis method where an electron beam is used to decompose gaseous molecules leading to deposition of a solid on a nearby substrate. [CHMO]

gas jet deposition
type: Class
subclass of: jet deposition
alternative label: jet vapour deposition
alternative label: jet-vapour deposition
alternative label: vapour jet deposition
alternative label: vapour-jet deposition
alternative label: GJD
alternative label: JVD
alternative label: PJD
alternative label: VJD
alternative label: gas-jet deposition
alternative label: jet vapor deposition
alternative label: jet-vapor deposition
alternative label: physical JD
alternative label: physical jet deposition
alternative label: physical-jet deposition
alternative label: vapor jet deposition
alternative label: vapor-jet deposition
definition: A synthesis method where a flow of carrier gas (moving at the speed of sound) containing vaporised precursors is projected onto a surface, resulting in a deposit. [CHMO]

metal-organic vapor-phase epitaxy
type: Class
subclass of: vapor-phase epitaxy
alternative label: metal organic vapour phase epitaxy
alternative label: metalorganic vapour phase epitaxy
alternative label: organometallic vapour phase epitaxy
alternative label: MOVPE
alternative label: OMVPE
alternative label: metal organic vapor phase epitaxy
alternative label: metalorganic vapor phase epitaxy
alternative label: organometallic vapor phase epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film, from organometallic vapour-phase precursors, on a monocrystalline substrate. [CHMO]
preferred label: metal-organic vapour-phase epitaxy

extreme ultraviolet lithography
type: Class
subclass of: ultraviolet lithography
alternative label: EUV lithography
alternative label: EUVL
alternative label: extreme ultraviolet (EUV) lithography
alternative label: extreme-ultraviolet lithography
alternative label: soft X-ray reflective lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense EUV (13.5 nm) light in a vacuum. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

epitaxy
type: Class
subclass of: deposition
definition: A synthesis method which consists of depositing a monocrystalline film (from liquid or gaseous precursors) on a monocrystalline substrate. [CHMO]

stop-flow lithography
type: Class
subclass of: ultraviolet lithography
alternative label: SFL
alternative label: stop flow lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. Shuttered pulses (30-100 ms) of mask-defined UV (365 nm) light are flashed into a stationery layer of monomer, which is sandwiched inside a microchannel before being flushed out. The process is then repeated in a cyclic manner. [CHMO]

steam methane reforming
type: Class
subclass of: catalytic steam reforming
alternative label: SMR
definition: The reaction of natural gas with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]

molding
type: Class
subclass of: soft lithography
definition: Any process for shaping pliable polymer materials using a rigid frame or model called a 'mould'. The polymer material (in liquid form) hardens or sets inside the mould, adopting its shape. [CHMO]
preferred label: moulding

infiltration
type: Class
subclass of: AFP_0001348
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a liquid or vapor. [CHMO]

aerosol method
type: Class
subclass of: colloid synthesis
alternative label: aerosol process
alternative label: aerosol processing
definition: A method for the synthesis of solid particles from an aerosol. The desired solid particles are suspended in a liquid, which is heated to 275-330 deg. C under pressure and passed through an orifice so that an aerosol forms. The particles in the aerosol are polymerised by partial evaporation of the solvent. [CHMO]

blow molding
type: Class
subclass of: molding
alternative label: blow forming
definition: A process for shaping pliable thermoplastic or thermosetting plastics using a rigid frame or model called a 'mould'. The plastic is heated and shaped into a tube then a pressurized gas, usually air, is used to expand the plastic and press it against the mould. [CHMO]
preferred label: blow moulding

UV-assisted capillary force lithography
type: Class
subclass of: capillary force lithography
alternative label: UV-assisted CFL
definition: A process for shaping pliable thermoplastic polymers. An elastomeric (polyurethane acrylate) mould is placed on a UV-curable polymer that has been spin- or drop-coated onto a substrate and partially cured using UV light (200-400 nm). The system is then further exposed to UV light and capillary force allows the polymer melt to fill up the void space between the polymer and the mould. After cooling to ambient temperature, the mould is removed, generating the negative replica of the mould pattern. [CHMO]

radio frequency sputter deposition
type: Class
subclass of: sputter deposition
alternative label: RF sputter deposition
alternative label: RF sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. The sign of the anode-cathode bias is varied at a high rate to avoid charge build-up on insulating targets. [CHMO]

electron-beam lithography
type: Class
subclass of: particle-beam lithography
alternative label: EB lithography
alternative label: EBDW
alternative label: EBL
alternative label: EPL
alternative label: e-beam lithography
alternative label: e-beam patterning
alternative label: electron beam (EB) lithography
alternative label: electron beam lithography
alternative label: electron beam patterning
alternative label: electron projection lithography
alternative label: electron-beam direct-write lithography
alternative label: electron-beam patterning
alternative label: electron-projection lithography
definition: A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (10-20 keV) is scanned across it in a patterned fashion. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The electron beam can be focused using either electric or magnetic fields. [CHMO]

Czochralski process
type: Class
subclass of: crystal growth method
definition: A method of producing large single crystals (of semiconductors or metals) by inserting a small seed crystal into a crucible filled with similar molten material, then slowly pulling the seed up from the melt while rotating it. [CHMO]

atmospheric-pressure chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: atmospheric pressure chemical vapour deposition
alternative label: APCVD
alternative label: atmospheric pressure CVD
alternative label: atmospheric pressure chemical vapor deposition
alternative label: atmospheric-pressure CVD
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, at atmospheric pressure, which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: atmospheric-pressure chemical vapour deposition

sol-gel method
type: Class
subclass of: colloid synthesis
alternative label: colloid process
alternative label: colloidal processing
alternative label: sol-gel process
alternative label: sol-gel processing
alternative label: solgel method
alternative label: solgel process
alternative label: solgel processing
definition: The process of the settling of (nm sized) particles from a colloidal suspension onto a pre-existing surface, resulting in ceramic materials. The desired solid particles (e.g. metal alkoxides) are suspended in a liquid, forming the 'sol', which is deposited on a substrate by spinning, dipping or coating, or transferred to a mould. The particles in the sol are polymerised by partial evaporation of the solvent, or addition of an initiator, forming the 'gel', which is then heated at high temperature to give the final solid product. [CHMO]

convective self-assembly
type: Class
subclass of: self-assembly
alternative label: convective assembly
definition: A synthesis method in which colloidal particle suspensions in thin evaporating films spontaneously (and reversibly) associate by non-covalent interactions. [CHMO]

self-assembly
type: Class
subclass of: AFP_0001640
alternative label: SA
definition: A process where the components of a sample spontaneously (and reversibly) associate by non-covalent interactions, forming an organised structure or pattern. Individual building blocks associate into more complex (higher-order) structures during self-assembly. [CHMO]

ion-beam sputter deposition
type: Class
subclass of: sputter deposition
alternative label: IBS
alternative label: ion-assisted sputtering
alternative label: ion-beam sputtering
alternative label: ion-beam-assisted sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. Ionization of the neutral gas atoms requires an external ion source, which generates a focused ion beam. [CHMO]

patterning by etching at the nanoscale
type: Class
subclass of: soft lithography
alternative label: PENs
definition: A process for shaping pliable polymer material using a microsized rigid frame or model called a 'mould'. A PDMS mould is etched with a fluoride-containing substance (breaking Si-O bonds at the surface). The fresh PDMS surface then reacts with a prepolymer. [CHMO]

aerosol assisted chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: aerosol-assisted chemical vapour deposition
alternative label: AACVD
alternative label: aerosol assisted CVD
alternative label: aerosol-assisted CVD
alternative label: aerosol-assisted chemical vapor deposition
definition: A synthesis method where the substrate is exposed to one or more involatile precursors, suspended in a liquid-gas aerosol (generated ultrasonically), which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: aerosol assisted chemical vapour deposition

scattering with angular limitation projection electron-beam lithography
type: Class
subclass of: electron-beam lithography
alternative label: SCALPEL
definition: A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (100 keV) is scanned across an ultrathin (<150 nm thickness) low-atomic-number patterned mask. Many of the electrons are scattered by the mask, so the image is formed only by those electrons that pass through the membrane without scattering. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]

DNA metallization
type: Class
subclass of: metallization
alternative label: DNA metalization
definition: The deposition of a layer of metal on DNA by chemically reducing DNA-complexed metal salts (e.g., Ag, Pd, Pt, and Cu). [CHMO]
preferred label: DNA metallisation

solvent-assisted micromolding
type: Class
subclass of: micromolding
alternative label: SAMIM
definition: A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. The mould is wetted with a thin layer of solvent. When the polymer is brought into contact with the mould, the top layer of polymer dissolves and expands, filling the mould. The solvent is then allowed to evaporate. [CHMO]
preferred label: solvent-assisted micromoulding

nanosphere lithography
type: Class
subclass of: patterning
alternative label: NSL
definition: A patterning technique that involves the self-assembly of nanospheres into a two-dimensional mask (by e.g. spin coating or drop coating). Following self-assembly, a metal is then deposited (e.g. by thermal evaporation, electron beam deposition or pulsed laser deposition) and the nanosphere mask is removed by sonicating the entire sample in a solvent, leaving behind the pattern. [CHMO]

micromolding
type: Class
subclass of: molding
definition: A process for shaping pliable polymer material using a microsized rigid frame or model called a 'mould'. The polymer material (in liquid form) is injected into a mould using a small diameter piston and then allowed to harden or set inside the mould, adopting its shape. [CHMO]
preferred label: micromoulding

cell culture
type: Class
subclass of: AFP_0001348
change note: 2024-09-12 Changed [OSTHUS] attribution to [Allotrope].
definition: Cell culture is a synthesis method for cells. It involves the dispersal of cells in an artificial environment composed of nutrient solutions. [Allotrope]

remote plasma-enhanced chemical vapor deposition
type: Class
subclass of: plasma-assisted chemical vapor deposition
alternative label: remote plasma assisted chemical vapour deposition
alternative label: remote plasma enhanced chemical vapour deposition
alternative label: RPECVD
alternative label: remote plasma assisted chemical vapor deposition
alternative label: remote plasma enhanced chemical vapor deposition
alternative label: remote plasma-assisted CVD
alternative label: remote plasma-enhanced CVD
definition: A synthesis method where the substrate is exposed to one or more volatile precursors which react or decompose in a plasma (a partially ionized gas, containing free electrons) and are then transferred to the surface to produce a deposit. The plasma enhances the rate of reaction. [CHMO]
preferred label: remote plasma-enhanced chemical vapour deposition

double-cathode glow discharge synthesis
type: Class
subclass of: glow discharge synthesis
definition: A synthesis method where an electrical discharge is passed under reduced pressure between two cathodes. One cathode is the source (or target) composed of the elements required to prepare the sample via sputtering, and the other cathode is the substrate material. When two different (negative) voltages are applied to the two cathodes, glow discharge occurs, causing a build up of the sample on the substrate cathode. [CHMO]

patterning
type: Class
subclass of: AFP_0001348
definition: Any synthesis technique involving the transfer of a pattern to a sample. [CHMO]

Verneuil process
type: Class
subclass of: crystal growth method
alternative label: flame fusion
definition: A method for preparing synthetic gemstones. A finely powdered sample is melted in an hydrogen-oxygen flame (2000 deg. C) and crystallising the melted droplets on a boule (a single crystal). [CHMO]

deposition
type: Class
subclass of: AFP_0001348
alternative label: material deposition
alternative label: sample deposition
definition: The process of the settling of particles (atoms or molecules) from a solution, suspension or vapour onto a pre-existing surface, resulting in the growth of a new phase. [CHMO]

ion beam-induced deposition
type: Class
subclass of: physical vapor deposition
alternative label: FIBID
alternative label: IBID
alternative label: focused-ion-beam-induced deposition
alternative label: focussed-ion-beam-induced deposition
alternative label: ion beam induced deposition
alternative label: ion-beam-induced deposition
definition: A synthesis method where an ion beam (e.g. Ga+) is used to decompose gaseous molecules leading to deposition on a nearby substrate. [CHMO]

physical vapor deposition
type: Class
subclass of: deposition
alternative label: PVD
definition: A synthesis technique where vaporized molecules or atoms condense on a surface, forming a thin layer. The process is purely physical; no chemical reaction occurs at the surface. [CHMO]
preferred label: physical vapour deposition

emulsification
type: Class
subclass of: colloid synthesis
alternative label: emulsion method
alternative label: emulsion process
alternative label: emulsion processing
definition: A method for dispersing two or more immiscible liquids by shaking, stirring or homogenising the mixture. [CHMO]

chemical vapor deposition synthesis of carbon nanotubes
type: Class
subclass of: carbon nanotube synthesis method
definition: A synthesis method for carbon nanotubes where a hydrocarbon vapor (such as methane) is thermally decomposed in a tube furnace in the presence of a metal catalyst. Carbon nanotubes grow over the catalyst and are collected upon cooling. Low temperatures yield multi-walled carbon nanotubes, whereas high temperatures favour single-walled carbon nanotubes. [CHMO]

electrochemical deposition
type: Class
subclass of: electrophoretic deposition
alternative label: cathodic electrodeposition
alternative label: electrocoating
alternative label: electrodeposition
alternative label: electroplating
definition: A synthesis method in which a film of solid metal is deposited from a solution of ions onto an electrically conducting surface (an electrode). Three electrodes are required (working, counter and reference) and when sufficient current is passed through the solution, metal ions are reduced at the working electrode. [CHMO]

Langmuir-Blodgett assembly
type: Class
subclass of: AFP_0001640
alternative label: Langmuir-Blodgett technique
definition: A method of depositing crystalline films one molecular layer at a time, by dipping the substrate into water containing a polymer that forms a single layer of molecular chains on the surface. This layer is then transferred from the water to the substrate. [CHMO]

metal-ion deposition
type: Class
subclass of: chemical solution deposition
alternative label: metal ion deposition
definition: The process of the settling of metal ions from a solution or suspension onto a pre-existing surface. [CHMO]

polymer preparation method
type: Class
subclass of: AFP_0001159
subclass of: AFP_0001348
AFX_0002798: true
definition: Any experimental method used to prepare polymer samples. [CHMO]

solvothermal synthesis
type: Class
subclass of: AFP_0001348
alternative label: solvothermal method
alternative label: solvothermal process
alternative label: solvothermal reaction
alternative label: solvothermal treatment
definition: A synthesis method for growing single crystals from a non-aqueous solution in an autoclave (a thick-walled steel vessel) at high temperature (400 deg. C) and pressure. [CHMO]

dip-pen nanolithography
type: Class
subclass of: scanning probe lithography
alternative label: DPN
definition: A synthesis technique where an atomic force microscope is used to pattern surfaces with molecules or particles. An AFM tip is coated with a chemical compound or biomolecule and put in contact with a substrate, where transfer takes place. [CHMO]

catalytic steam reforming
type: Class
subclass of: steam reforming
alternative label: CSR
definition: The reaction of hydrocarbons with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]

wet spinning
type: Class
subclass of: spinning
alternative label: wet-spinning
definition: A process used to create polymer fibers. Polymer dissolved in a solvent is forced through a spinneret (a multi-pored device similar to a shower head) into a chemical bath which causes the polymer to precipitate as it emerges. [CHMO]

nanoimprint lithography
type: Class
subclass of: nanolithography
alternative label: NIL
alternative label: nano-imprinting lithography
alternative label: nanoimprinting lithography
definition: A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then pressed into the resist and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. [CHMO]

liquid-phase infiltration
type: Class
subclass of: infiltration
alternative label: melt infiltration
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a liquid. [CHMO]

heteroepitaxy
type: Class
subclass of: epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film (from liquid or gaseous precursors) of one substance, on a monocrystalline substrate of a different substance. [CHMO]

liquid-phase epitaxy
type: Class
subclass of: epitaxy
alternative label: LPE
alternative label: liquid phase epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film (from liquid or melt precursors) on a monocrystalline substrate. [CHMO]

vapor-phase growth
type: Class
subclass of: carbon nanotube synthesis method
alternative label: vapor phase deposition
alternative label: vapour phase growth
alternative label: vapour-phase decomposition
alternative label: vapour-phase deposition
alternative label: VPG
alternative label: vapor phase growth
alternative label: vapor-phase decomposition
alternative label: vapor-phase deposition
definition: A synthesis method for carbon nanotubes where an organometallic precursor (typically tungsten-based) is vaporised then heated in an Ar and C2H2 atmosphere to 950 deg. C. [CHMO]
preferred label: vapour-phase growth

metallization
type: Class
subclass of: deposition
alternative label: metal deposition
alternative label: metalisation
alternative label: metalization
definition: The deposition of a layer of metal on a substrate (usually to provide electrical contacts in devices). A number of techniques may be used for metallization including evaporation and sputter coating. [CHMO]
preferred label: metallisation

electrokinetic patterning
type: Class
subclass of: patterning
definition: Any patterning technique that utlilises the movement of particles under the influence of an electric field (e.g. electroosmosis or electrophoresis). [CHMO]

thermally induced phase separation
type: Class
subclass of: phase inversion technique
alternative label: TIPS
alternative label: thermally-induced phase separation
definition: A method for preparing a polymer membrane by mixing the polymer with a substance that acts as a solvent a high temperature and casting the solution into a film. When the solution is cooled, solidification occurs. [CHMO]

roller nanoimprint lithography
type: Class
subclass of: thermoplastic nanoimprint lithography
definition: A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A stamp containing the desired (nanosized) pattern on its surface is placed on the substrate. A roller, heated to the glass transition temperature of the resist, is then used to press the stamp into the resist. The resist is cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. [CHMO]

miniemulsion polymerization
type: Class
subclass of: emulsion polymerization
alternative label: mini-emulsion polymerisation
alternative label: mini-emulsion polymerization
definition: A polymer preparation technique in which monomer (usually acrylic) 50-500 nm droplets are dispersed in a continuous aqueous phase and are kept colloidally stable through the use of a surfactant and are stablised against Ostwald ripening using a costabiliser such as hexadecane. [CHMO]
preferred label: miniemulsion polymerisation

dispersion polymerization
type: Class
subclass of: polymer preparation method
definition: A polymer preparation technique in which an insoluble polymer is dispersed in a continuous organic phase. [CHMO]
preferred label: dispersion polymerisation

templated self-assembly
type: Class
subclass of: self-assembly
alternative label: TSA
alternative label: templated self assembly
definition: A synthesis method in which the components of the sample spontaneously (and reversibly) associate by non-covalent interactions, forming a organised structure or pattern on a physical template. Individual building blocks associate into more complex (higher-order) structures during self-assembly. [CHMO]

laser ablation synthesis in solution
type: Class
subclass of: colloid synthesis
alternative label: LASiS
alternative label: LASiS technique
definition: A method for obtaining colloidal solutions of nanoparticles by the condensation of a plasma plume formed by the laser ablation of a bulk metal plate dipped in a solution. [CHMO]

atomic layer deposition
type: Class
subclass of: deposition
alternative label: ALD
alternative label: atomic-layer deposition
definition: A thin film deposition technique based on the sequential reaction of gaseous precursors at a surface to produce a monolayer. [CHMO]

vapor-phase epitaxy
type: Class
subclass of: epitaxy
alternative label: vapour phase epitaxy
alternative label: vapour-phase epitaxial growth
alternative label: VPE
alternative label: vapor phase epitaxy
alternative label: vapor-phase epitaxial growth
definition: A synthesis method which consists of depositing a monocrystalline film (from vapour-phase precursors) on a monocrystalline substrate. [CHMO]
preferred label: vapour-phase epitaxy

microwave-polyol method
type: Class
subclass of: polyol method
alternative label: MW-polyol method
alternative label: microwave-assisted polyol method
definition: The synthesis of metal-containing compounds in poly(ethylene glycol)s heated by microwave irradiation. The ethylene glycols act as both the solvent and reducing agent. [CHMO]

magnetron sputter deposition
type: Class
subclass of: sputter deposition
alternative label: magnetron sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) generated in a magnetron (a device that uses electrical and magnetic fields to generate heat) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [CHMO]

ionothermal synthesis
type: Class
subclass of: AFP_0001348
definition: A synthesis method for growing single crystals from an ionic liquid in an autoclave (a thick-walled steel vessel) at high temperature (400 deg. C) and pressure. [CHMO]

replica molding
type: Class
subclass of: molding
alternative label: REM
definition: A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. A mould is cast from the object to be replicated. This mould is then filled with a prepolymer, which is cross-linked and the resulting polymer is peeled off the mould. Using a mould, rather than the object itself, allows multiple copies to be made without damaging the original. [CHMO]
preferred label: replica moulding

electroless metal deposition
type: Class
subclass of: chemical solution deposition
subclass of: metallization
definition: A synthesis method in which a film of solid metal is deposited from a solution of ions onto an electrically conducting surface. No external power source is required, but a reductant is added to the solution to initiate the reduction of the metal ions. [CHMO]

distillation-precipitation copolymerization
type: Class
subclass of: polymer preparation method
alternative label: distillation precipitation copolymerisation
alternative label: distillation precipitation copolymerization
definition: A polymer preparation technique in which two different types of monomer are dissolved in an organic solvent and distilled until a precipitate of the corresponding copolymer is formed. [CHMO]
preferred label: distillation-precipitation copolymerisation

colloidal crystal templating
type: Class
subclass of: polymer synthesis
definition: A synthesis method in which polymer spheres are assembled into a colloidal crystal on a substrate by evaporation induced self-assembly. The free spaces between the spheres are subsequently infiltrated with a metal by electrodeposition, and the colloidal particles are selectively removed by dissolution in a solvent (e.g. toluene) leaving behind a periodic arrangement of spherical voids embedded in a solid macroporous matrix. [CHMO]

high-pressure carbon monoxide method
type: Class
subclass of: carbon nanotube synthesis method
alternative label: HiPCO
alternative label: HiPCO method
alternative label: HiPco
alternative label: HiPco method
alternative label: high-pressure CO conversion
definition: A synthesis method for carbon nanotubes that involves mixing high pressure (e.g. 30 atmospheres) CO that has been preheated (1000 deg. C) and a catalyst precursor gas (metal carbonyl or metallocene). Under these conditions the precursor decomposes forming metal particle clusters on which carbon nanotubes nucleate and grow. The carbon nanotubes are 99% single-walled carbon nanotubes with small diameters (e.g., (5,5) tubes). [CHMO]

catalytic steam reforming of methanol
type: Class
subclass of: catalytic steam reforming
alternative label: CSRM
alternative label: methanol steam reforming
definition: The reaction of methanol with steam at high temperature (700-1000 deg. C) in the presence of a nickel catalyst, in order to produce hydrogen. [CHMO]

gas-phase plasma hydrocarbonation
type: Class
subclass of: carbon nanotube synthesis method
alternative label: gas phase plasma hydrocarbonation
definition: A synthesis method for semiconducting single-walled carbon nanotubes where as-grown single-walled carbon nanotubes are treated with a methane plasma at 400-600 deg. C in a vacuum and the metallic single-walled carbon nanotubes are selectively etched. [CHMO]

scanning near-field photolithography
type: Class
subclass of: lithography
alternative label: SNP
definition: A synthesis method which uses light and a self-assembled monolayer (SAM) to transfer a pattern to a substrate. A solution of an alkanethiol is deposited on the substrate, forming a SAM. UV light (244 nm) from a scanning near-field optical microscope (aperture size = 50 nm) is then used to oxidise the SAM in certain areas. Either the oxidised areas of the SAM, or the gold corresponding to those areas, is then removed by etching. [CHMO]

aerosol jet deposition
type: Class
subclass of: jet deposition
alternative label: AJD
alternative label: aerosol JD
definition: A synthesis method where an aerosol containing precursors is projected onto a surface, resulting in a deposit. [CHMO]

liquid silicon infiltration
type: Class
subclass of: liquid-phase infiltration
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, liquid silicon. [CHMO]

chemical vapor transport
type: Class
subclass of: crystal growth method
alternative label: CVT
definition: A crystal growth method for metal dichalcogenides in which the starting materials (high purity metal and chalcogen) are placed in a quartz ampoule together with a transport agent (e.g. iodine) and heated in a furnace under a temperature gradient. [CHMO]
preferred label: chemical vapour transport

micromolding in capillaries
type: Class
subclass of: micromolding
alternative label: MIMIC
definition: A process for shaping pliable polymer materials using a microsized rigid frame or model called a 'mould'. The mould is brought into contact with a rigid substrate, forming microchannels. The polymer material (in fluid form) fills these microchannels by capillary action. The polymer material is then cooled or cross-linked. [CHMO]
preferred label: micromoulding in capillaries

low-energy e-beam proximity lithography
type: Class
subclass of: electron-beam lithography
alternative label: LEEPL
alternative label: e-beam proximity lithography
alternative label: ebeam proximity lithography
alternative label: electron-beam proximity lithography
definition: A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of moderately low energy electrons (2 keV) is scanned across a patterned mask (held up to 50 µm from the substrate surface). The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). [CHMO]

mechanosynthesis
type: Class
subclass of: AFP_0001348
definition: A synthesis method in which the reaction outcome is determined by the use of mechanical constraints to direct reactive molecules to specific molecular sites. [CHMO]

electron-beam projection lithography
type: Class
subclass of: electron-beam lithography
alternative label: EPL
alternative label: e-beam projection lithography
alternative label: ebeam projection lithography
definition: A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (100 keV) is scanned across a patterned mask. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The electron beam can be focused using either electric or magnetic fields. [CHMO]

surface-assisted chemical vapor transport
type: Class
subclass of: chemical vapor transport
alternative label: surface assisted chemical vapour transport
alternative label: surface-assisted chemical-vapour-transport
alternative label: SA-CVT
alternative label: SACVT
alternative label: surface assisted CVT
alternative label: surface assisted chemical vapor transport
alternative label: surface-assisted CVT
alternative label: surface-assisted chemical-vapor-transport
change note: 2016-02-03 Switched labels [OSTHUS]
change note: 2016-02-25 fix translation [OSTHUS]
definition: A crystal growth method for metal dichalcogenides in which the starting materials (high-purity metal and chalcogen powders) are placed in one half of a quartz ampoule together with a transport agent (e.g. iodine) and heated in a furnace under a temperature gradient. The product crystals are grown on the surface of a sheet of high-purity metal in the other half of the ampoule. [CHMO]
preferred label: surface-assisted chemical vapour transport

electron beam curing
type: Class
subclass of: curing
alternative label: E-beam curing
alternative label: EB curing
alternative label: e-beam curing
alternative label: electron-beam curing
definition: A chemical process in which a prepolymer is converted into a polymer and then into a network, upon irradiation with an electron beam. [CHMO]

atomic layer epitaxy
type: Class
subclass of: epitaxy
alternative label: ALE
alternative label: atomic-layer epitaxy
definition: A synthesis method that consists of depositing alternating monolayers of two elements onto a substrate. The deposition is self-limiting and is completed when all available chemisorption sites are occupied. Film thickness is controlled by the number of precursor cycles. [CHMO]

photolithography
type: Class
subclass of: lithography
alternative label: optical lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to a pattern of intense (typically UV) light and a post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

evaporation-induced self-assembly
type: Class
subclass of: self-assembly
alternative label: EISA
alternative label: evaporation induced self assembly
alternative label: evaporation induced self-assembly
definition: A synthesis method in which a drop of solvent is placed on the components to be assembled and allowed to dry freely in air. The solvent evaporation causes the spontaneous association of individual components into an organised structure or pattern. [CHMO]

projection reduction exposure with variable axis immersion lenses
type: Class
subclass of: electron-beam projection lithography
comment: 2016-02-24 fix pref label [OSTHUS]
alternative label: PREVAIL
definition: A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (100 keV) is scanned across a patterned mask. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The lens system used to focus the electron beam has a 4-times magnification and a 250 µm2 exposure field, and was developed by IBM and Nikon. [CHMO]

colloidal lithography
type: Class
subclass of: lithography
definition: Any synthesis technique involving the transfer of a pattern to a material (a 'resist') by exposure to a radiation source (e.g. light or X-rays) or to a beam of charged particles through a mask composed of a close-packed colloidal array. Upon irradiation, the material experiences a change in its physical properties. Excess material is then removed, by a liquid 'developer' or an etching process. [CHMO]

low-energy electron-beam lithography
type: Class
subclass of: electron-beam lithography
alternative label: LEEB
alternative label: LEEBI
alternative label: LEEBL
alternative label: LVEBL
alternative label: low energy electron beam irradiation
alternative label: low energy electron-beam irradiation
alternative label: low-energy electron-beam irradiation
alternative label: low-voltage electron beam lithography
alternative label: low-voltage energy beam lithography
definition: A synthesis technique that uses electrons to transfer a pattern to a substrate. The substrate is coated with a film (or 'resist) and a beam of electrons (1 keV) is scanned across it in a patterned fashion. The electrons induce chemical reactions in the resist and the desired pattern is obtained by selectively removing either exposed or non-exposed regions of the resist ('developing'). The electron beam can be focused using either electric or magnetic fields. [CHMO]

laser chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: laser assisted chemical vapour deposition
alternative label: laser-assisted chemical vapour deposition
alternative label: laser-induced chemical vapour deposition
alternative label: LCVD
alternative label: laser CVD
alternative label: laser assisted CVD
alternative label: laser assisted chemical vapor deposition
alternative label: laser induced CVD
alternative label: laser-assisted CVD
alternative label: laser-assisted chemical vapor deposition
alternative label: laser-induced CVD
alternative label: laser-induced chemical vapor deposition
definition: A synthesis method where a laser-heated substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: laser chemical vapour deposition

direct liquid injection chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: direct-liquid-injection chemical vapour deposition
alternative label: DLICVD
alternative label: direct liquid injection CVD
alternative label: direct-liquid-injection CVD
alternative label: direct-liquid-injection chemical vapor deposition
definition: A synthesis method where the substrate is exposed to one or more liquid precursors, which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: direct liquid injection chemical vapour deposition

low-pressure chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: LPCVD
alternative label: low pressure CVD
alternative label: low pressure chemical vapor deposition
alternative label: low pressure chemical vapour deposition
alternative label: low-pressure CVD
alternative label: low-pressure chemical vapour deposition
change note: 2016-02-03 Switched labels [OSTHUS]
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, at less than atmospheric pressure, which react or decompose on the surface to produce a deposit. [CHMO]

metal evaporation
type: Class
subclass of: thermal evaporation
subclass of: metallization
alternative label: ME
alternative label: MET
alternative label: metal evaporation technique
alternative label: metal shadowing
definition: A synthesis technique where the substrate is placed in a vacuum (<10^{-4} Pa) and a metal electrode (e.g. Au, Cr, Zn or Pt) is melted and evaporated by passing a current through it. When the metal atoms hit the (much cooler) substrate they condense into nanoscale particles, forming a thin deposit on the surface. [CHMO]

sandwich sublimation
type: Class
subclass of: seeded sublimation
alternative label: SSM
alternative label: close space sublimation
alternative label: close-space sublimation
alternative label: sandwich sublimation method
alternative label: sandwich sublimation technique
alternative label: sandwich-sublimation method
alternative label: sublimation sandwich method
alternative label: sublimation-sandwich method
definition: A technique for growing thick (µm) epitaxial layers of SiC by heating a source (polycrystalline SiC or powder) at high temperature (1800-2600 deg. C) and low pressure in an Ar atmosphere causing it to sublime. The vapours then condense on a single crystal of SiC (the 'seed') placed a few mm away. [CHMO]

metal-organic chemical vapor deposition
type: Class
subclass of: chemical vapor deposition
alternative label: metalorganic chemical vapour deposition
alternative label: organometallic chemical vapour deposition
alternative label: MOCVD
alternative label: OMCVD
alternative label: metalorganic CVD
alternative label: metalorganic chemical vapor deposition
alternative label: organometallic chemical vapor deposition
change note: 2016-02-03 Switched labels [OSTHUS]
change note: 2016-02-25 fix translation [OSTHUS]
definition: A synthesis method where the substrate is exposed to volatile precursors (one of which is an organometallic compound) which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: metal-organic chemical vapour deposition

silanization
type: Class
subclass of: deposition
definition: The deposition of a layer of silane-like molecules on a surface (e.g. glass or mica) through self-assembly. [CHMO]
preferred label: silanisation

optically induced electrokinetic patterning
type: Class
subclass of: electrokinetic patterning
alternative label: optically-induced electrokinetic patterning
alternative label: opto-electrokinetic patterning
alternative label: optoelectrokinetic patterning
definition: Any technique that utlilises the movement of particles under the influence of an electric field (e.g. electroosmosis or electrophoresis) in conjunction with illumination of a photosensitive substrate to form a pattern. [CHMO]

transfer molding
type: Class
subclass of: molding
alternative label: TM
definition: A process for shaping pliable polymer materials using a rigid frame or model called a 'mould'. The mould is filled with a prepolymer then the whole assembly is transferred to a flat substrate where the prepolymer is cross-linked and the mould removed. [CHMO]
preferred label: transfer moulding

cathodic arc deposition
type: Class
subclass of: physical vapor deposition
alternative label: arc physical vapor deposition
alternative label: arc physical vapour deposition
alternative label: arc-PVD
alternative label: arc-physical vapor deposition
alternative label: arc-physical vapour deposition
definition: A synthesis technique where an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. [CHMO]

breath-figure templating
type: Class
subclass of: polymer synthesis
alternative label: BF method
alternative label: breath figure method
alternative label: breath figure templating
alternative label: breath figure-driven templating
alternative label: breath-figure method
definition: The method of using hexagonally-packed water microspheres as templates for the fabrication of microporous polymer films. [CHMO]

homoepitaxy
type: Class
subclass of: epitaxy
definition: A synthesis method which consists of depositing a monocrystalline film (from liquid or gaseous precursors) on a monocrystalline substrate of the same substance. [CHMO]

chemical vapor deposition
type: Class
subclass of: deposition
alternative label: CVD (chemical vapour deposition) synthesis
alternative label: chemical-vapour deposition
alternative label: CVD
alternative label: CVD (chemical vapor deposition) synthesis
alternative label: chemical-vapor deposition
definition: A synthesis method where the substrate is exposed to one or more volatile precursors, which react or decompose on the surface to produce a deposit. [CHMO]
preferred label: chemical vapour deposition

solid-phase epitaxy
type: Class
subclass of: epitaxy
alternative label: SPE
alternative label: solid phase epitaxy
definition: A synthesis method which consists of depositing an amorphous film on a monocrystalline substrate, then heating the substrate to crystallise the film. [CHMO]

peptization
type: Class
subclass of: AFP_0001159
subclass of: AFP_0001348
alternative label: deflocculation
definition: Reversal of coagulation or flocculation, i.e., the dispersion of aggregates to form a colloidally stable suspension or emulsion. [CHMO]
preferred label: peptisation

solvent casting and particulate leaching
type: Class
subclass of: solvent casting
alternative label: SCPL
definition: A process for forming thermoplastic polymer samples by dipping a mould into a solution of the polymer and particles of known dimension, and drawing off the solvent to leave a composite polymer-particle film adhering to the mould. [CHMO]

double patterning lithography
type: Class
subclass of: photolithography
alternative label: DPL
alternative label: double-patterning lithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. The photoresist is then exposed to two different patterns of intense (typically UV) light using two different masks. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

high-target-utilization sputter deposition
type: Class
subclass of: plasma sputter deposition
alternative label: high-target-utilisation sputtering
alternative label: high-target-utilization sputtering
definition: A synthesis technique where a solid target is bombarded with energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. Ionization of the neutral gas atoms requires an external plasma (a partially ionized gas containing free electrons) source, which generates an ion beam. [CHMO]
preferred label: high-target-utilisation sputter deposition

chemical vapor infiltration
type: Class
subclass of: infiltration
alternative label: CVI
definition: The process of filling in the pores of a material (e.g. a ceramic) by reaction with, or deposition from, a vapour. [CHMO]
preferred label: chemical vapour infiltration

electrochemical nanoimprint lithography
type: Class
subclass of: nanoimprint lithography
alternative label: electrochemical nanoimprinting
alternative label: superionic electrochemical nanoimprinting
definition: A synthesis technique that uses an electrochemical reaction to transfer a pattern to a substrate. A superionic conductor (e.g. Ag2S) stamp containing the desired (nanosized) pattern on its surface is pressed onto a metal substrate. When a voltage is applied across the substrate and stamp, metal ions move from the substrate to the stamp leaving behind the complementary pattern. [CHMO]

aqueous-phase reforming
type: Class
subclass of: reforming
alternative label: APR
alternative label: aqueous phase reforming
definition: The reaction of biomass-derived oxygenated compounds (e.g. glycerol) in aqueous solution at low temperature in the presence of a platinum catalyst to produce hydrogen. [CHMO]

dry deposition
type: Class
subclass of: deposition
definition: The process of the settling of particles (atoms or molecules) from a gas or vapor onto a pre-existing surface, resulting in the growth of a new phase. [CHMO]

microscope projection photolithography
type: Class
subclass of: photolithography
alternative label: MPP
alternative label: MPPL
alternative label: microscope-projection photolithography
definition: A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. The photoresist-coated substrate is then heated to drive off excess solvent ('soft-baked', 'prebaked', 'post-application baked', PAB), typically at 90-100 deg. C. A reduced image of the desired pattern is then projected on the photoresist using a microscope and the substrate is exposed to intense (typically UV) light. A post-exposure bake (PEB) at 120-180 deg. C is performed before immersing the substrate in a 'developer' which removes excess photoresist. Positive photoresist becomes soluble in the developer when exposed; negative photoresist becomes insoluble in the developer. Finally the substrate is baked again ('hard-baked') to solidify the remaining photoresist. [CHMO]

carbon nanotube synthesis method
type: Class
equivalent class: CHMO_0002239
equivalent class: Class
  intersection of: nanostructure synthesis
  intersection of: Restriction
    on property: produces
    some values from: CHEBI_50594
subclass of: nanostructure synthesis
definition: Any method used to synthesise carbon nanotubes. [CHMO]

Acheson method
type: Class
subclass of: crystal growth method
alternative label: Acheson technique
definition: A method for growing low-purity polycrystalline SiC. A mixture of silica, carbon, sawdust and NaCl is heated to 2700 deg. C in a furnace, and the temperature gradually decreased. [CHMO]

nanoparticle synthesis
type: Class
equivalent class: CHMO_0002837
equivalent class: Class
  intersection of: nanostructure synthesis
  intersection of: Restriction
    on property: produces
    some values from: CHEBI_50803
AFX_0002798: true

nanostructure synthesis
type: Class
equivalent class: CHMO_0002838
equivalent class: Class
  intersection of: AFP_0001348
  intersection of: Restriction
    on property: produces
    some values from: CHEBI_50795
subclass of: AFP_0001348

synthesis method
type: Class
subclass of: AFP_0001348
subclass of: OBI_0000094
change note: 2017-09-27 Curated term to align with AFO. [OSTHUS]
definition: A method used to synthesise a sample. [CHMO]

OBI_0000652
type: Class
equivalent class: Restriction
  on property: OBI_0000417
  some values from: OBI_0000686
subclass of: AFP_0001348
subclass of: OBI_0000094
subclass of: Restriction
  on property: OBI_0000293
  some values from: BFO_0000040
subclass of: Restriction
  on property: OBI_0000299
  some values from: BFO_0000040
IAO_0000114: IAO_0000122
change note: 2017-09-27 Curated term to align with AFO. [OSTHUS]

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